Fracture behavior of diamondlike carbon films deposited on polymer substrates

2018 ◽  
Vol 36 (2) ◽  
pp. 02C101 ◽  
Author(s):  
Go Yamamoto ◽  
Tomonaga Okabe ◽  
Noriaki Ikenaga
1993 ◽  
Vol 334 ◽  
Author(s):  
I.B. Graff ◽  
R.A. Pugliese ◽  
P.R. Westmoreland

AbstractMolecular-beam mass spectrometry has been used to study plasma-enhanced chemical vapor deposition (PECVD) of diamondlike carbon films. A threshold-ionization technique was used to identify and quantify species in the plasma. Mole fractions of H, H2, CH4, C2H2, C2H6 and Ar were measured in an 83.3% CH4/Ar mixture at a pressure of 0.1 torr and a total flow of 30 sccm. Comparisons were made between mole fractions measured at plasma powers of 25W and 50W. These results were compared to measured concentration profiles and to film growth rates.


1992 ◽  
Author(s):  
Taras V. Kononenko ◽  
Vitali I. Konov ◽  
Victor G. Ralchenko ◽  
V. E. Strelnitsky

1992 ◽  
Author(s):  
Kaoru Suzuki ◽  
Tetsuya Taniyama ◽  
Junji Nakata ◽  
Takaya Masutani

2009 ◽  
Vol 48 (9) ◽  
pp. 092304 ◽  
Author(s):  
Susumu Takabayashi ◽  
Keishi Okamoto ◽  
Tatsuyuki Nakatani ◽  
Hiroyuki Sakaue ◽  
Takayuki Takahagi

2009 ◽  
Vol 131 (3) ◽  
Author(s):  
Pamela L. Dickrell ◽  
N. Argibay ◽  
Osman L. Eryilmaz ◽  
Ali Erdemir ◽  
W. Gregory Sawyer

Microtribological measurements of a hydrogenated diamondlike carbon film in controlled gaseous environments show that water vapor plays a significant role in the friction coefficient. These experiments reveal an initial high friction transient behavior that does not reoccur even after extended periods of exposure to low partial pressures of H2O and O2. Experiments varying both water vapor pressure and sample temperature show trends of a decreasing friction coefficient as a function of both the decreasing water vapor pressure and the increasing substrate temperature. Theses trends are examined with regard to first order gas-surface interactions. Model fits give activation energies on the order of 40 kJ/mol, which is consistent with water vapor desorption.


1991 ◽  
Author(s):  
V. Y. Armeyev ◽  
A. H. Arslanbekov ◽  
N. I. Chapliev ◽  
Vitali I. Konov ◽  
Victor G. Ralchenko ◽  
...  

Author(s):  
SAMUEL A. ALTEROVITZ ◽  
N. SAVVIDES ◽  
F.W. SMITH ◽  
JOHN A. WOOLLAM

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