Effect of ion energy on structural and electrical properties of intrinsic microcrystalline silicon layer deposited in a matrix distributed electron cyclotron resonance plasma reactor

Plasma Reactor ◽

Silicon Layer ◽

Electron Cyclotron ◽

Microcrystalline Silicon ◽

Ion Energy ◽

Structural And Electrical Properties ◽

Structural and electrical properties of thin microcrystalline silicon films deposited by an electron cyclotron resonance plasma discharge of 2% SiH4/Ar further diluted in H2

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581481 ◽

1998 ◽

Vol 16 (5) ◽

pp. 2751-2756 ◽

Cited By ~ 11

Author(s):

B. B. Jagannathan ◽

R. L. Wallace ◽

W. A. Anderson

Keyword(s):

Electrical Properties ◽

Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Structural And Electrical Properties ◽

Structural and electrical properties of Zr oxide film for high-k gate dielectrics by using electron cyclotron resonance plasma sputtering

Applied Physics A ◽

10.1007/s00339-003-2483-z ◽

2004 ◽

Vol 80 (8) ◽

pp. 1781-1787 ◽

Cited By ~ 13

Author(s):

J. Wang ◽

L. Zhao ◽

N. H.Luu ◽

D. Wang ◽

H. Nakashima

Keyword(s):

Electrical Properties ◽

Oxide Film ◽

Cyclotron Resonance ◽

Gate Dielectrics ◽

Electron Cyclotron ◽

Plasma Sputtering ◽

High K ◽

Structural And Electrical Properties ◽

Electrical properties of electron cyclotron resonance plasma-deposited silicon dioxide: effect of the oxygen to silane flow ratio

Semiconductor Science and Technology ◽

10.1088/0268-1242/11/3/023 ◽

1996 ◽

Vol 11 (3) ◽

pp. 422-426 ◽

Cited By ~ 6

Author(s):

M J Hernandez ◽

J Garrido ◽

J Martinez ◽

J Piqueras

Keyword(s):

Electrical Properties ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Flow Ratio ◽

Investigations on electrical properties of a-C:H thin films deposited in a Microwave Multipolar Plasma reactor excited at Distributed Electron Cyclotron Resonance

Diamond and Related Materials ◽

10.1016/j.diamond.2008.01.036 ◽

2008 ◽

Vol 17 (7-10) ◽

pp. 1710-1715 ◽

Cited By ~ 6

Author(s):

M. Kihel ◽

R. Clergereaux ◽

D. Escaich ◽

M. Calafat ◽

P. Raynaud ◽

...

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron

Effects of dc bias on the kinetics and electrical properties of silicon dioxide grown in an electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.349264 ◽

1991 ◽

Vol 70 (6) ◽

pp. 3301-3313 ◽

Cited By ~ 52

Author(s):

D. A. Carl ◽

D. W. Hess ◽

M. A. Lieberman ◽

T. D. Nguyen ◽

R. Gronsky

Keyword(s):

Electrical Properties ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Dc Bias ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Operational characteristics of SF6 etching in an electron cyclotron resonance plasma reactor

10.1116/1.585612 ◽

1991 ◽

Vol 9 (2) ◽

pp. 318 ◽

Cited By ~ 29

Author(s):

J. L. Cecchi

Keyword(s):

Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron ◽

Operational Characteristics ◽

Spatially resolved ion velocity distributions in a diverging field electron cyclotron resonance plasma reactor

Applied Physics Letters ◽

10.1063/1.103482 ◽

1990 ◽

Vol 57 (12) ◽

pp. 1188-1190 ◽

Cited By ~ 39

Author(s):

Dennis J. Trevor ◽

Nader Sadeghi ◽

Toshiki Nakano ◽

Jacques Derouard ◽

Richard A. Gottscho ◽

...

Keyword(s):

Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron ◽

Spatially Resolved ◽

Field Electron ◽

Ion Velocity ◽

Electrical properties of GaAs selectively grown by electron cyclotron resonance plasma‐excited molecular beam epitaxy

Applied Physics Letters ◽

10.1063/1.105221 ◽

1991 ◽

Vol 58 (6) ◽

pp. 604-606 ◽

Cited By ~ 4

Author(s):

Norio Yamamoto ◽

Naoto Kondo ◽

Yasushi Nanishi

Keyword(s):

Electrical Properties ◽

Molecular Beam Epitaxy ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron ◽

Highly homogeneous silica coatings for optical and protective applications deposited by PECVD at room temperature in a planar uniform distributed electron cyclotron resonance plasma reactor.

Thin Solid Films ◽

10.1016/0040-6090(96)80068-x ◽

1995 ◽

Vol 270 (1-2) ◽

pp. 49-54 ◽

Cited By ~ 12

Author(s):

J.C. Rostaing ◽

F. Coeuret ◽

J. Pelletier ◽

T. Lagarde ◽

R. Etemadi

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Plasma Reactor ◽

Electron Cyclotron ◽

Silica Coatings ◽

Electron cyclotron resonance plasma reactor for cryogenic etching

Review of Scientific Instruments ◽

10.1063/1.1144284 ◽

1993 ◽

Vol 64 (12) ◽

pp. 3572-3584 ◽

Cited By ~ 17

Author(s):

Eray S. Aydil ◽

Jeffrey A. Gregus ◽

Richard A. Gottscho

Keyword(s):

Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron ◽