Cl2/Ar plasma etching of binary, ternary, and quaternary In-based compound semiconductors
1996 ◽
Vol 14
(4)
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pp. 2567
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2020 ◽
Vol 109
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pp. 104929
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Keyword(s):
2004 ◽
Vol 22
(6)
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pp. 2336-2341
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2013 ◽
Vol 2
(3)
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pp. P110-P113
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Keyword(s):
1999 ◽
Vol 147
(1-4)
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pp. 207-214
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1989 ◽
Vol 63
(11)
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pp. 4697-4702
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Keyword(s):