scholarly journals Real-time in situ process monitoring and characterization of GaN films grown on Si (100) by low-temperature hollow-cathode plasma-atomic layer deposition using trimethylgallium and N2/H2 plasma

2021 ◽  
Vol 39 (2) ◽  
pp. 022406
Author(s):  
Deepa Shukla ◽  
Adnan Mohammad ◽  
Saidjafarzoda Ilhom ◽  
Brian G. Willis ◽  
Ali Kemal Okyay ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Real Time ◽  
Process Monitoring ◽  
Hollow Cathode ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition

scholarly journals Low-temperature grown wurtzite InxGa1−xN thin films via hollow cathode plasma-assisted atomic layer deposition

2015 ◽  
Vol 3 (37) ◽  
pp. 9620-9630 ◽  
Author(s):  
Ali Haider ◽  
Seda Kizir ◽  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Shahid Ali Leghari ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Band Gap ◽  
Hollow Cathode ◽  
Optical Band Gap ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition ◽  
Wide Range

Hollow cathode plasma assisted atomic layer deposited InxGa1−xN alloys show successful tunability of the optical band gap by changing the In concentration in a wide range.

scholarly journals Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures

2015 ◽  
Vol 12 (4-5) ◽  
pp. 394-398 ◽  
Author(s):  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Sami Bolat ◽  
Burak Tekcan ◽  
Fatma Kayaci ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition

scholarly journals Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1−xN thin films at low temperatures

2014 ◽  
Vol 2 (12) ◽  
pp. 2123-2136 ◽  
Author(s):  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Ali Kemal Okyay ◽  
Necmi Biyikli
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Low Temperatures ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Cathode Plasma ◽  
Temperature Plasma ◽  
Layer Deposition

The authors report on the use of hollow cathode plasma for low-temperature plasma-assisted atomic layer deposition (PA-ALD) of crystalline AlN, GaN and AlxGa1−xN thin films with low impurity concentrations.

Exploring Inherently Selective Plasma Processing of Nitrides and Oxides Via Hollow-Cathode Plasma-Assisted Atomic Layer Deposition

2020 ◽  
Vol MA2020-02 (23) ◽  
pp. 1664-1664
Author(s):  
Adnan Mohammad ◽  
Saidjafarzoda Ilhom ◽  
Deepa Shukla ◽  
Brian Willis ◽  
Ali K. Okyay ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Plasma Processing ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition
Sign in / Sign up

Export Citation Format

Share Document