Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition

2021 ◽  
Vol 39 (4) ◽  
pp. 042403
Author(s):  
Zachary C. Sobell ◽  
Andrew S. Cavanagh ◽  
David R. Boris ◽  
Scott G. Walton ◽  
Steven M. George
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Atomic Layer ◽  
Plasma Electron ◽  
Electron Source ◽  
Cathode Plasma ◽  
Plasma Electron Source ◽  
Layer Deposition ◽  
Temperature Deposition

scholarly journals Low-temperature grown wurtzite InxGa1−xN thin films via hollow cathode plasma-assisted atomic layer deposition

2015 ◽  
Vol 3 (37) ◽  
pp. 9620-9630 ◽  
Author(s):  
Ali Haider ◽  
Seda Kizir ◽  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Shahid Ali Leghari ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Band Gap ◽  
Hollow Cathode ◽  
Optical Band Gap ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition ◽  
Wide Range

Hollow cathode plasma assisted atomic layer deposited InxGa1−xN alloys show successful tunability of the optical band gap by changing the In concentration in a wide range.

scholarly journals Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures

2015 ◽  
Vol 12 (4-5) ◽  
pp. 394-398 ◽  
Author(s):  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Sami Bolat ◽  
Burak Tekcan ◽  
Fatma Kayaci ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition

scholarly journals Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1−xN thin films at low temperatures

2014 ◽  
Vol 2 (12) ◽  
pp. 2123-2136 ◽  
Author(s):  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Ali Kemal Okyay ◽  
Necmi Biyikli
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Low Temperatures ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Cathode Plasma ◽  
Temperature Plasma ◽  
Layer Deposition

The authors report on the use of hollow cathode plasma for low-temperature plasma-assisted atomic layer deposition (PA-ALD) of crystalline AlN, GaN and AlxGa1−xN thin films with low impurity concentrations.

Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

2015 ◽  
Vol 51 (86) ◽  
pp. 15692-15695 ◽  
Author(s):  
A. Delabie ◽  
M. Caymax ◽  
B. Groven ◽  
M. Heyne ◽  
K. Haesevoets ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Reducing Agents ◽  
Layer Deposition ◽  
Temperature Deposition ◽  
The Impact

We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors.

Exploring Inherently Selective Plasma Processing of Nitrides and Oxides Via Hollow-Cathode Plasma-Assisted Atomic Layer Deposition

2020 ◽  
Vol MA2020-02 (23) ◽  
pp. 1664-1664
Author(s):  
Adnan Mohammad ◽  
Saidjafarzoda Ilhom ◽  
Deepa Shukla ◽  
Brian Willis ◽  
Ali K. Okyay ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Plasma Processing ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition
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