Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors
2021 ◽
Vol 39
(6)
◽
pp. 063403
Johan G. Hulkko
◽
Katalin Böőr
◽
Ren Qiu
◽
Olof Bäcke
◽
Mats Boman
◽
...
2021 ◽
Vol 542
◽
pp. 148530
Kexin Deng
◽
Xinhua Wang
◽
Sen Huang
◽
Haibo Yin
◽
Jie Fan
◽
...
1982 ◽
Vol 41
(9)
◽
pp. 844-846
◽
H. L. Hwang
◽
C. C. Hwu
◽
J. C. Liue
◽
H. H. Lin
Min-Shyong Lin
◽
Hen-Chang Chou
1987 ◽
Vol 62
(7)
◽
pp. 2830-2835
◽
D. K. Sadana
◽
A. E. Morgan
◽
M. H. Norcott
◽
S. Naik
1989 ◽
Vol 7
(3)
◽
pp. 1446-1450
◽
Dean Freeman
◽
Werner Kern
2014 ◽
Vol 550
◽
pp. 545-553
◽
Kiyoteru Kobayashi
◽
Aran Suzuki
◽
Kokichi Ishikawa
SV Nguyen
◽
JR Abernathey
◽
SA Fridmann
◽
ML Gibson
1993 ◽
Vol 73
(5)
◽
pp. 2397-2401
◽
S. S. Ang
◽
Y. J. Shi
◽
W. D. Brown
1994 ◽
Vol 64
(20)
◽
pp. 2709-2711
◽
C. A. Dimitriadis
◽
D. H. Tassis
◽
N. A. Economou
◽
G. Giakoumakis