scholarly journals Meniscus-controlled printing of single-crystal interfaces showing extremely sharp switching transistor operation

2020 ◽  
Vol 6 (41) ◽  
pp. eabc8847
Author(s):  
Gyo Kitahara ◽  
Satoru Inoue ◽  
Toshiki Higashino ◽  
Mitsuhiro Ikawa ◽  
Taichi Hayashi ◽  
...  

Meniscus, a curvature of droplet surface around solids, takes critical roles in solution-based thin-film processing. Extension of meniscus shape, and eventual uniform film growth, is strictly limited on highly lyophobic surfaces, although such surface should considerably improve switching characteristics. Here, we demonstrate a technique to control the solution meniscus, allowing to manufacture single-crystalline organic semiconductor (OSC) films on the highest lyophobic amorphous perfluoropolymer, Cytop. We used U-shaped metal film pattern produced on the Cytop surface, to initiate OSC film growth and to keep the meniscus extended on the Cytop surface. The growing edge of the OSC film helped maintain the meniscus extension, leading to a successive film growth. This technique facilitates extremely sharp switching transistors with a subthreshold swing of 63 mV dec−1 owing to the effective elimination of charge traps at the semiconductor/dielectric interface. The technique should expand the capability of print production of functional films and devices.

1997 ◽  
Vol 04 (02) ◽  
pp. 219-222 ◽  
Author(s):  
T. LEWOWSKI ◽  
P. WIECZOREK

The possibility of modification of the thin film growth on an insulating (sapphire) substrate by using a Ga monolayer as a "surfactant" was studied. We found that the films grown in this way are electrically conducting and can emit photoelectrons at much lower thickness than those deposited on a pure substrate. The surfactant stabilizes the positions of Ag atoms on the substrate surface and inhibits the coalescence of small nuclei into bigger islands, even when the film is annealed to 450 K. This fact may be very important for thin metal film technology.


2003 ◽  
Vol 90 (1) ◽  
Author(s):  
A. C. Dürr ◽  
F. Schreiber ◽  
K. A. Ritley ◽  
V. Kruppa ◽  
J. Krug ◽  
...  

2006 ◽  
Vol 124 (5) ◽  
pp. 054716 ◽  
Author(s):  
Huang Han ◽  
Zhang Hanjie ◽  
Bernhard Botters ◽  
Chen Qiao ◽  
Mao Hongying ◽  
...  

Author(s):  
P. Lu ◽  
W. Huang ◽  
C.S. Chern ◽  
Y.Q. Li ◽  
J. Zhao ◽  
...  

The YBa2Cu3O7-x thin films formed by metalorganic chemical vapor deposition(MOCVD) have been reported to have excellent superconducting properties including a sharp zero resistance transition temperature (Tc) of 89 K and a high critical current density of 2.3x106 A/cm2 or higher. The origin of the high critical current in the thin film compared to bulk materials is attributed to its structural properties such as orientation, grain boundaries and defects on the scale of the coherent length. In this report, we present microstructural aspects of the thin films deposited on the (100) LaAlO3 substrate, which process the highest critical current density.Details of the thin film growth process have been reported elsewhere. The thin films were examined in both planar and cross-section view by electron microscopy. TEM sample preparation was carried out using conventional grinding, dimpling and ion milling techniques. Special care was taken to avoid exposure of the thin films to water during the preparation processes.


2018 ◽  
Author(s):  
Weikun Zhu ◽  
Erfan Mohammadi ◽  
Ying Diao

Morphology modulation offers significant control over organic electronic device performance. However, morphology quantification has been rarely carried out via image analysis. In this work, we designed a MATLAB program to evaluate two key parameters describing morphology of small molecule semiconductor thin films: fractal dimension and film coverage. We then employ this program in a case study of meniscus-guided coating of 2,7-dioctyl[1]benzothieno[3,2-b][1]benzothiophene (C<sub>8</sub>-BTBT) under various conditions to analyze a diverse and complex morphology set. The evolution of morphology in terms of fractal dimension and film coverage was studied as a function of coating speed. We discovered that combined fractal dimension and film coverage can quantitatively capture the key characteristics of C<sub>8</sub>-BTBT thin film morphology; change of these two parameters further inform morphology transition. Furthermore, fractal dimension could potentially shed light on thin film growth mechanisms.


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