Characterization of high microwave power atmospheric pressure plasma torch

2018 ◽  
Vol 96 (7) ◽  
pp. 851-854
Author(s):  
B. Turkyilmaz ◽  
D. Mansuroglu ◽  
I.U. Uzun-Kaymak
Keyword(s):  
Microwave Power ◽  
Atmospheric Pressure ◽  
Plasma Torch ◽  
Microwave Plasma ◽  
Atmospheric Pressure Plasma ◽  
Optical Emission ◽  
Spectral Lines ◽  
Plasma Parameters ◽  
Boltzmann Plot ◽  
Plasma Torches

An atmospheric pressure microwave plasma torch operating at 2.45 GHz frequency using a surfaguide waveguide fed by argon gas at a constant rate is characterized at various microwave power settings. Coarse optical emission spectroscopy technique is used to diagnose the plasma parameters. The Boltzmann plot method is implemented to measure the electron temperature. Using the Doppler shift of the strong argon atomic spectral lines, the plasma velocity is determined. These results are in good agreement with earlier studies conducted on similar microwave plasma torches at a lower power setting. In this study, we exceed the previous power limitations observed in earlier studies and scan the microwave power in increments up to 2 kW.

scholarly journals Gliding arc triggered microwave plasma arc at atmospheric pressure for coal gasification application

2014 ◽  
Vol 32 ◽  
pp. 1460345
Author(s):  
Vishal Jain ◽  
A. Visani ◽  
C. Patil ◽  
B. K. Patel ◽  
P. K. Sharma ◽  
...  
Keyword(s):  
High Temperature ◽  
Microwave Power ◽  
Atmospheric Pressure ◽  
Plasma Torch ◽  
Microwave Plasma ◽  
Arc Discharge ◽  
Effluent Treatment ◽  
Plasma Arc ◽  
Gliding Arc ◽  
Consumable Electrodes

Plasma torch is device that efficiently converts electrical energy in to thermal energy for various high temperature applications. The conventional plasma torch comprises of consumable electrodes namely anode and cathode electrodes. The replacement of these electrodes is a complex process owing to its cooling and process shut down requirements. However, microwave plasma arc is electrode-less plasma arc system that is an alternative method to conventional arc technology for generating plasma arc. In this technique, microwave power is efficiently coupled to generate plasma arc by using the property of polar molecule to absorb microwave power. The absorption of microwave power is in form of losses due to intermolecular friction and high collisions between the molecules. This is an efficient method because all microwave power can be absorbed by plasma arc. The main feature of microwave plasma arc is its large uniform high temperature column which is not possible with conventional arc discharge methods. Such type of plasma discharge is very useful in applications where sufficient residence time for treat materials is required. Microwave arc does not require any consumable electrodes and hence, it can be operated continuously that makes it very useful for hazardous effluent treatment applications. Further, microwave cannot ionize neutral particles at atmospheric pressure and hence, a gliding arc is initiated between two thin electrodes in the cavity by applying very low power high voltage (3kV) AC source. In this report, the method for generating microwave arc of 1kW power using commercial microwave oven is elaborated.

Cuprous Oxide Films Prepared by Using a Microwave Atmospheric Pressure Plasma Torch

2008 ◽  
Vol 47-50 ◽  
pp. 1015-1018 ◽  
Author(s):  
Hong Ying Chen ◽  
Lien Teng Kuo ◽  
Wan Yu Chang ◽  
Cheng Hsien Tsai
Keyword(s):  
Plasma Treatment ◽  
Cuprous Oxide ◽  
Atmospheric Pressure ◽  
Plasma Torch ◽  
Microwave Plasma ◽  
Cupric Oxide ◽  
Oxide Films ◽  
Atmospheric Pressure Plasma ◽  
Oxide Phase ◽  
Nitrogen Plasma

A 2.45 GHz microwave atmospheric pressure torch is employed to prepare cuprous oxide films. The sputtered copper films are firstly deposited on slide glass. After that, the films are annealed in air at 500°C for 12 h, which would directly oxidize into cupric oxide. The annealed films are then treated by atmospheric nitrogen plasma at 800 W for 10 min. The color changed significantly from black to reddish brown after nitrogen plasma treatment. The X-ray diffraction patterns show that annealed films are cupric oxide which is vanished after plasma treatment. The cuprous oxide films appeared after nitrogen plasma treatment. The resistivity of annealed films is 16.7 --cm, which reduce to 2.08 --cm after plasma treatment. The optical band gap of annealed films, cupric oxide phase, is 2.1 eV but the value shifts toward 2.4 eV after plasma treatment. The novel microwave plasma torch posses a fast and easy way to fabricate cuprous oxide films.

Determination of the Excitation Temperature in a Nonthermodynamic-Equilibrium High-Pressure Helium Microwave Plasma Torch

1997 ◽  
Vol 51 (6) ◽  
pp. 778-784 ◽  
Author(s):  
M. C. Quintero ◽  
A. Rodero ◽  
M. C. García ◽  
A. Sola
Keyword(s):  
Atmospheric Pressure ◽  
Plasma Torch ◽  
Microwave Plasma ◽  
Absolute Intensity ◽  
Atomic State ◽  
Excitation Temperature ◽  
State Distribution ◽  
Boltzmann Plot ◽  
Intensity Measurements

This paper analyzes the influence of the departure from thermodynamic equilibrium on three spectroscopic methods for determining the excitation temperature: the classical Boltzmann plot method, the method of absolute intensity measurements, and the method of the ratio of atomic to ionic lines for one element. Use of these methods is illustrated with experiments conducted in a helium microwave plasma in nonthermodynamic equilibrium produced by an axial injection torch at atmospheric pressure. The excitation temperature was determined at a variable microwave power and different positions along the flame. The results are discussed in terms of the atomic-state distribution function (ASDF) calculated for the plasma.

scholarly journals Surface Modification of Polycarbonate by an Atmospheric Pressure Argon Microwave Plasma Sheet

Materials ◽  
2019 ◽  
Vol 12 (15) ◽  
pp. 2418 ◽  
Author(s):  
Dariusz Czylkowski ◽  
Bartosz Hrycak ◽  
Andrzej Sikora ◽  
Magdalena Moczała-Dusanowska ◽  
Mirosław Dors ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Surface Modification ◽  
Plasma Sheet ◽  
Microwave Power ◽  
Atmospheric Pressure ◽  
Microwave Plasma ◽  
Atmospheric Pressure Plasma ◽  
Plasma Source ◽  
Material Surface ◽  
Pressure Plasma

The specific properties of an atmospheric pressure plasma make it an attractive tool for the surface treatment of various materials. With this in mind, this paper presents the results of experimental investigations of a polycarbonate (PC) material surface modification using this new type of argon microwave (2.45 GHz) plasma source. The uniqueness of the new plasma source lies in the shape of the generated plasma—in contrast to other microwave plasma sources, which usually provide a plasma in the form of a flame or column, the new ones provides a plasma in the shape of a regular plasma sheet. The influence of the absorbed microwave power and the number of scans on the changes of the wettability and morphological and mechanical properties of the plasma-treated PC samples was investigated. The mechanical properties and changes in roughness of the samples were measured by the use of atomic force microscopy (AFM). The wettability of the plasma-modified samples was tested by measuring the water contact angle. In order to confirm the plasma effect, each of the above-mentioned measurements was performed before and after plasma treatment. All experimental tests were performed with an argon of flow rate up to 20 L/min and the absorbed microwave power ranged from 300 to 850 W. The results prove the capability of the new atmospheric pressure plasma type in modifying the morphological and mechanical properties of PC surfaces for industrial applications.

scholarly journals Merits of microwave plasmas for optical emission spectrometry – characterization of an axially viewed microwave-sustained, inductively coupled, atmospheric-pressure plasma (MICAP)

2020 ◽  
Vol 35 (10) ◽  
pp. 2369-2377
Author(s):  
Helmar Wiltsche ◽  
Matthias Wolfgang
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Optical Emission ◽  
Plasma Source ◽  
Optical Emission Spectrometry ◽  
Emission Spectrometry ◽  
Icp Oes ◽  
Microwave Plasmas ◽  
Inductively Coupled

The MICAP is a microwave driven plasma source employing nitrogen as the plasma gas. In this work we compare LODs and LOQs obtained in axial viewing with those obtained by ICP-OES and evaluate the effect of air instead of nitrogen as the plasma gas.

scholarly journals Optical Emission and Mass Spectra Observations during Hydrogen Combustion in Atmospheric Pressure Microwave Plasma

2012 ◽  
Vol 7 (0) ◽  
pp. 2401075-2401075 ◽  
Author(s):  
Naomichi EZUMI ◽  
Kazuhiko AKAHANE ◽  
Keiji SAWADA ◽  
Yasunori TANAKA ◽  
Masahiro TANAKA ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Mass Spectra ◽  
Microwave Plasma ◽  
Optical Emission ◽  
Hydrogen Combustion
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