The effect of static and modulated uniaxial constraint on impurity band conduction in p-type germanium

1982 ◽  
Vol 60 (1) ◽  
pp. 102-108
Author(s):  
B. A. Lombos ◽  
M. Averous ◽  
C. Fau ◽  
J. Calas ◽  
S. Charar

Transport property measurements on p-type germanium, doped to be in the intermediate concentration region (1016 < NA < 1018 cm−3), were performed in the temperature range of 1.6–77 K under static (up to 337 MPa) and modulated (2.4 on 180 MPa) uniaxial compression. To elucidate the conduction mechanisms in this region the position of the Fermi level is calculated as a function of temperature and uniaxial stress and correlated to the variation of the measured transport properties. The analyses indicate an Anderson type metallic conduction, characteristic of random, amorphous systems, while the Fermi level is in the impurity band. Mott type metallic conduction, characteristic to periodic systems, determines the transport properties as the Fermi level moves out of the impurity band.

1956 ◽  
Vol 34 (12A) ◽  
pp. 1356-1368 ◽  
Author(s):  
N. F. Mott

A discussion is given of the conductivity to be expected from a crystalline array of atoms when the interatomic distance a is varied. It is shown that both for monovalent atoms and divalent atoms the conductivity is zero at T = 0 when a is large, the wave function of the system being real so that no current is possible. In both types of atom a discontinuous transition to a state showing metallic conductivity is predicted at a definite value of a. For divalent atoms calculations using Bloch orbitals and localized Wannier functions give essentially the same result; for monovalent metals they do not, and correspond to physically different states of the system. Applications are made to impurity-band conduction in semiconductors, the impurity centers being treated by the usual model as expanded atoms in a uniform dielectric. It is shown that the concentrations at which "metallic" conductivity sets in are not unexpected, but that it is difficult to understand impurity band conduction at lower concentrations unless the semiconductors are "compensated", either chemically or through the presence of dislocations.


Author(s):  
Nikolai A. Poklonski ◽  
Sergey A. Vyrko ◽  
Aliaksandr N. Dzeraviaha

In the work the dependence of the thermal ionization energy of hydrogen-like donors and acceptors on their concentration in n- and p-type semiconductors is analyzed analytically and numerically. The impurity concentrations and temperatures at which the semiconductors are on the insulator side of the concentration insulator – metal phase transition (Mott transition) are considered. It is assumed that impurities in the crystal are distributed randomly (according to Poisson), and their energy levels are distributed normally (according to Gauss). In the quasi-classical approximation, it is shown, for the first time, that the decrease in the ionization energy of impurities mainly occurs due to the joint manifestation of two reasons. Firstly, from the excited states of electrically neutral impurities, a quasicontinuous band of allowed energy values is formed for c-band electrons in an n-type crystal (or for v-band holes in a p-type crystal). This reduces the energy required for the thermally activated transition of electron from the donor to the c-band (for the transition of the hole from the acceptor to the v-band). Secondly, from the ground (unexcited) states of impurities a classical impurity band is formed, the width of which at low temperatures is determined only by the concentration of impurity ions. In moderately compensated semiconductors (when the ratio of the concentration of minority impurities to the concentration of majority impurities is less than 50 %) the Fermi level is located closer to the edge of the band of allowed energy values than the middle of the impurity band, that issue reduces thermal ionization energy of impurities from states in the vicinity of the Fermi level (transition of electron from a donor to the c-band, or hole from an acceptor to the v-band). Previously, these two causes of decrease in the thermal ionization energy due to increase in the concentration of impurities were considered separately. The results of calculations according to the proposed formulas are quantitatively agree with the known experimental data for a number of semiconductor materials (germanium, silicon, diamond, gallium arsenide and phosphide, silicon carbide, zinc selenide) with a moderate compensation ratio.


2012 ◽  
Vol 101 (8) ◽  
pp. 082106 ◽  
Author(s):  
Brendan Gunning ◽  
Jonathan Lowder ◽  
Michael Moseley ◽  
W. Alan Doolittle

2018 ◽  
Vol 84 ◽  
pp. 115-118 ◽  
Author(s):  
Guiying Shen ◽  
Youwen Zhao ◽  
Yongbiao Bai ◽  
Ding Yu ◽  
Jingming Liu ◽  
...  

Physica B+C ◽  
1981 ◽  
Vol 107 (1-3) ◽  
pp. 115-116 ◽  
Author(s):  
P.C. Sharma ◽  
K.P. Roy ◽  
V. Radhakrishanan

1992 ◽  
Vol 7 (9) ◽  
pp. 2465-2477 ◽  
Author(s):  
B. Molnar

This paper deals with the electrical characterization of thin layers of cubic SiC, grown on (100) Si substrates. The resistivity and Hall coefficient for undoped SiC layers were measured between 10 K and 500 K. The influence of inhomogeneities on the electrical properties of the as-grown films has been established. The Hall data show a clear sign of a transition to impurity band conduction. The donor concentrations studied are in the “intermediate” range. The donor activation energy has been shown to decrease with increasing nitrogen concentration. The nitrogen concentration was measured by SIMS. The variation in nitrogen concentration is also seen in changes in the shape of the ESR spectrum. The presence of nitrogen in the intermediate concentration range is the most likely reason for the conflicting values reported for the donor ionization energy as measured by Hall and PL measurements.


2011 ◽  
Vol 208 (12) ◽  
pp. 2753-2759 ◽  
Author(s):  
P. H. Michael Böttger ◽  
Gregory S. Pomrehn ◽  
G. Jeffrey Snyder ◽  
Terje G. Finstad

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