CHARACTERIZATION OF NICKEL OXIDE THIN FILM — DC REACTIVE MAGNETRON SPUTTERING

2011 ◽  
Vol 18 (01n02) ◽  
pp. 11-15 ◽  
Author(s):  
K. ASHOK
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Nickel Oxide ◽  
Deposition Time ◽  
Preferred Orientation ◽  
Oxide Thin Film ◽  
Morphological Properties ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force

Nickel oxide ( NiO ) thin films were deposited on glass substrates by reactive direct current (DC) magnetron sputtering of a Ni target in an Ar / O 2 mixture. The effect of thickness (0.2 μm, 0.4 μm and 1 μm) on the structural and surface morphological properties of NiO thin films was investigated. These films were characterized by X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM). The films were cubic NiO , with preferred orientation in the (111) direction at lower deposition time (10 mins). At higher deposition time (60 mins) the preferred orientation shifted to (200) plane. Electrochemical behavior of NiO thin films for different thickness samples were analyzed between the electrode potential ‑0.2 and 0.8 V vs scanning calomel electrode (SCE) in both anodic and cathodic directions and the current responses were measured.

Synthesis and Characterization of Nb-Doped TiO2 Thin Films Prepared by RF Magnetron Sputtering

2015 ◽  
Vol 1117 ◽  
pp. 139-142 ◽  
Author(s):  
Marius Dobromir ◽  
Radu Paul Apetrei ◽  
A.V. Rogachev ◽  
Dmitry L. Kovalenko ◽  
Dumitru Luca
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
X Ray ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Diffraction Patterns

Amorphous Nb-doped TiO2 thin films were deposited on (100) Si and glass substrates at room temperature by RF magnetron sputtering and a mosaic-type Nb2O5-TiO2 sputtering target. To adjust the amount of the niobium dopant in the film samples, appropriate numbers of Nb2O5 pellets were placed on the circular area of the magnetron target with intensive sputtering. By adjusting the discharge conditions and the number of niobium oxide pellets, films with dopant content varying between 0 and 16.2 at.% were prepared, as demonstrated by X-ray photoelectron spectroscopy data. The X-ray diffraction patterns of the as-deposited samples showed the lack of crystalline ordering in the samples. Surfaces roughness and energy band gap values increase with dopant concentration, as showed by atomic force microscopy and UV-Vis spectroscopy measurements.

EFFECT OF SPRAY DEPOSITION TIME ON OPTICAL AND MORPHOLOGICAL PROPERTIES OF P3HT: PCBM THIN FILMS

2015 ◽  
Vol 77 (1) ◽  
Author(s):  
Farhana Aziz ◽  
Ahmad Fauzi Ismail
Keyword(s):  
Thin Films ◽  
Deposition Time ◽  
Spray Deposition ◽  
Polymer Solar Cells ◽  
Power Conversion ◽  
Spray Coating ◽  
Morphological Properties ◽  
Inhomogeneous Surface ◽  
Force Microscopy ◽  
Atomic Force

This paper investigated the effect of spray deposition time on optical and morphological properties of P3HT: PCBM thin films. The effects of spray deposition time on the optical and morphological properties of thin films were investigated using optical microscopy, UV-Vis spectrophotometry and atomic force microscopy (AFM). The AFM spectra show that the thin films prepared at 10s spray deposition time are more uniform while the 15s and 20s samples presented coffee ring shapes with inhomogeneous surface formation. The ridge-like features can be observed in the surface for all samples and become more pronounced with increasing spray deposition time. The root mean square (RMS) roughness of the samples increased with increasing spray deposition time. Based on the absorption results, it is concluded that higher spray coating times result in lower crystallinity of the thin film. The 10 s spray deposition time is the most suitable deposition time for producing thin films with good morphology and crystallinity for polymer solar cells (PSCs) with improved power conversion efficiency (PCE).

scholarly journals Surface Morphology of Cus Thin Films Observed by Atomic Force Microscopy

2011 ◽  
Vol 16 ◽  
pp. 24 ◽  
Author(s):  
Anuar Kassim ◽  
Ho Soon Min ◽  
Lim Kian Siang ◽  
Saravanan Nagalingam
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Surface Morphology ◽  
Deposition Time ◽  
Substrate Surface ◽  
Complexing Agent ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Incomplete Coverage

CuS thin films were deposited onto microscope glass substrates using the chemical bath deposition method in the presence of tartaric acid as a complexing agent. The objective of this paper was to study the influence of the deposition time on the morphology of thin films. The surface morphology of the thin films was investigated using atomic force microscopy. The thin films deposited for the shortest time were found to be   uniform,  without  cracks and with a dense  surface  morphology covering the entire substrate surface area. However, the films prepared for 60 min and above indicated incomplete coverage of the material over the substrate surface. The surface roughness and film thickness values that were observed depended mainly on the deposition time.  

Effects of Growth Temperature on the Structural Properties of Zinc Oxide Nanograins Deposited by RF Magnetron Sputtering

2014 ◽  
Vol 895 ◽  
pp. 500-504
Author(s):  
N. Ameera ◽  
A. Shuhaimi ◽  
S. Najwa ◽  
K.M. Hakim ◽  
M. Mazwan ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Growth Temperature ◽  
Deposition Time ◽  
Rf Magnetron Sputtering ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force

Nanograins zinc oxide (ZnO) withc-axis preferred orientation was deposited on glass substrates by RF magnetron sputtering. It was performed with a ZnO target with 99.999% purity at RF power of 200 W. The deposition was carried out in argon and oxygen ambient at the ratio flow-rates of 10 and 5 sccm respectively, with total deposition time of 1 hour. The films were grown atgrowth temperatures were specified at RT, 100, 200, 300, 400 and 500°C. The effects of the growth temperature on the ZnO structural property was investigated by x-ray diffraction (XRD). The best ZnO crystalline quality obtained at growth temperature, TGof 300°C was further characterized by field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM).

Influence of Deposition Time on ZnO Films Grown by RF Magnetron Sputtering

2012 ◽  
Vol 562-564 ◽  
pp. 175-178 ◽  
Author(s):  
Zi Jun Ma
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Time ◽  
Green Emission ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Green Emission Band ◽  
Atomic Force ◽  
Surface Morphologies

ZnO thin films were prepared on glass substrates by radio frequency co-reactive magnetron sputtering at different deposition time of 20, 40, 60 and 80 min. Surface morphologies and crystal structures were examined using atomic force microscopy and X-ray diffraction. As the deposition time increased to 60 min, surface morphologies of the films became smooth and distributed uniformly. The crystallinity along the c-axis improved as the deposition time increased. The photoluminescence (PL) studies indicate that three main emission peaks located at 439nm, 483nm and 525nm were observed. The intensity of 439nm emission increased to maximum as the deposition time was 80 min, while the intensity of green emission band (from 483 to 525nm) attained to maximum as the deposition time increased to 60 min.

scholarly journals Structural and Morphological Properties of Titanium Aluminum Nitride Coatings Produced by Triode Magnetron Sputtering

2014 ◽  
Vol 10 (20) ◽  
pp. 51-64 ◽  
Author(s):  
D.M. Devia ◽  
E. Restrepo-Parra ◽  
J.M. Velez-Restrepo
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Structural Changes ◽  
Morphological Properties ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Atomic Force ◽  
Titanium Aluminum ◽  
Microscopy Techniques ◽  
Titanium Aluminum Nitride

Tix Al1−xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscopy, x-ray diffraction and atomic force microscopy techniques. As the bias voltage increased, an increase inthe Al atomic percentage was observed competing with Ti and producing structural changes. At low Al concentrations, the film presented a FCC crystalline structure; nevertheless, as Al was increased, the structure pre-sented a mix of FCC and HCP phases. On the other hand, an increase inbias voltage produced a decrease films thickness due to an increase in colli-sions. Moreover, the grain size and roughness were also strongly influencedby bias voltage.

WO3:Mo and WO3:Ti Thin Films Deposited by Spray Pyrolysis: The Influence of Metallic Concentration on Physical Properties: An Electron Microscopy and Atomic Force Study

2019 ◽  
Vol 286 ◽  
pp. 49-63
Author(s):  
Dwight Acosta ◽  
Francisco Hernández ◽  
Alejandra López-Suárez ◽  
Carlos Magaña
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Ultra Violet ◽  
Surface Characteristics ◽  
Structural Defects ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Transmission Electron ◽  
Resolution Electron

WO3:Mo and WO3:Ti thin films have been deposited on FTO/Glass substrates by the pulsed chemical spray technique at a substrate temperature of Ts= 450°C. The influence of Mo and Ti doping on the structural, electrical, and optical behavior of WO3thin films, has been studied by X-Ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), Atomic Force Microscopy (AFM), Ultra Violet and Visible Spectrometry (UV-VIS), and Surface Conductivity Methods (Four Points). Doped WO3films presents similar polycrystalline structures but with noticeable modifications in surface configurations at micrometric and nanometric levels, as the Mo and Ti concentration is systematically increased in the starting sprayed solution. From processed High-Resolution Electron Micrographs (HREM), a low density of structural defects was found on pure and doped WO3grains. This lead to conclude that variations in films surface characteristics are mainly related with metallic doping concentrations which in turn, have noticeable influence in electrical and optical behaviors reported in this work.

Studies of Hydroxyapatite Thin Coating Produced by Dual RF Magnetron Sputtering for Biomedical Applications

2011 ◽  
Vol 493-494 ◽  
pp. 473-476
Author(s):  
E.O. Lopez ◽  
F.F. Borghi ◽  
Alexandre Mello ◽  
J. Gomes ◽  
Antonella M. Rossi
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Time ◽  
Grazing Incidence ◽  
Rf Magnetron Sputtering ◽  
Nanocrystalline Phase ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Atomic Force ◽  
Sputtering Power

In this present work, we characterize HAp thin films deposited by dual magnetron sputtering device DMS on silicon (Si/HAp). The sputtering RF power was varied from 90 watts to 120 watts and deposition times from 60 to 180 minutes. The argon and oxygen pressure were fixed at 5.0 mTorr and 1.0 mTorr, respectively. Grazing incidence X-ray diffraction (GIXRD) from synchrotron radiation, infrared spectroscopy (FTIR) and atomic force microscopy (AFM) were used for the structural characterization. At lower deposition times, a crystalline phase with preferential orientation along apatite (002) and a disordered nanocrystalline phase were identified. The coating crystallinity was improved with the increase of the deposition time besides the sputtering power.

scholarly journals Investigating the Nanocomposite Thin Films of Hematite α-Fe2O3 and Nafion for Cholesterol Biosensing Applications

2020 ◽  
Vol 2 ◽  
Author(s):  
Indra Sulania ◽  
R. Blessy Pricilla ◽  
G. B. V. S. Lakshmi
Keyword(s):  
Thin Films ◽  
Indium Tin Oxide ◽  
Differential Pulse ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Enzyme Substrate ◽  
Atomic Force ◽  
Nanocomposite Thin Films ◽  
Multi Phase ◽  
Cholesterol Biosensor

Nanocomposite materials are multi-phase materials, usually solids, which have two or more component materials having different chemical and physical properties. When blended together, a newer material is formed with distinctive properties which make them an eligible candidate for many important applications. In the present study, thin films of nafion (polymer) and hematite or α-Fe2O3 (nanoparticles) nanocomposite is fabricated on indium tin oxide (ITO) coated glass substrates, due to its enhanced ionic conductivity, for cholesterol biosensor applications. Scanning electron microscopy and Atomic force microscopy revealed the formation of nanorod structured α-Fe2O3 in the films. The cyclic voltammetry (CV) studies of nafion-α-Fe2O3/ITO revealed the redox properties of the nanocomposites. The sensing studies were performed on nafion-α-Fe2O3/CHOx/ITO bioelectrode using differential pulse voltammetry (DPV) at various concentrations of cholesterol. The enzyme immobilization leaded to the selective detection of cholesterol with a sensitivity of 64.93 × 10−2 μA (mg/dl)−1 cm−2. The enzyme substrate interaction (Michaelis–Menten) constant Km, was obtained to be 19 mg/dl.

Sign in / Sign up

Export Citation Format

Share Document