STUDY ON THE PREPARATION OF DLC FILMS DEPOSITED ON SILVER NANOPARTICLES AND THE SENSITIVITY OF LSPR INTERFACE

2013 ◽  
Vol 20 (03n04) ◽  
pp. 1350024
Author(s):  
DAN ZENG ◽  
NANYU MA ◽  
YUJIE HUANG ◽  
ZHENYI FEI ◽  
MUSEN LI ◽  
...  
Keyword(s):  
Silver Nanoparticles ◽  
Film Thickness ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Diamond Like Carbon ◽  
Arc Plasma ◽  
Vacuum Degree ◽  
Performance Results ◽  
Short Time ◽  
Sensing Performance

Diamond-like carbon (DLC) films were deposited on the surface of silver nanoparticles (NPs) using two different sets of technology parameters by radio-frequency magnetron arc plasma enhanced chemical vapor deposition (PECVD) in this paper. The probe profilometer, SEM, AFM, Raman spectroscopy, XPS and UV–vis spectrophotometer were used to characterize the film thickness, microstructure, composition and sensing performance. Results showed that the basic vacuum degree had a greater influence on the properties of DLC films than that of RF forward power. The LSPR interface prepared in short time had sensing performance, but the sensitivity decreased with the thickness of DLC films increase. DLC films of higher sp3 bonds content can slow down the decline rate of the sensitivity caused by increasing of the film thickness.

Nanoscale Film Thickness Gradients Printed in Open Air by Spatially Varying Chemical Vapor Deposition

2021 ◽  
pp. 2103271
Author(s):  
Abdullah H. Alshehri ◽  
Jhi Yong Loke ◽  
Viet Huong Nguyen ◽  
Alexander Jones ◽  
Hatameh Asgarimoghaddam ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Film Thickness ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Spatially Varying

Surface studies of diamond-like carbon films grown by plasma-enhanced chemical vapor deposition

2010 ◽  
Vol 42 (12-13) ◽  
pp. 1702-1705 ◽  
Author(s):  
R. Maheswaran ◽  
R. Sivaraman ◽  
O. Mahapatra ◽  
P. C. Rao ◽  
C. Gopalakrishnan ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Surface Studies

Formation of Diamond-Like Carbon Films by Photoemission-Assisted Plasma-Enhanced Chemical Vapor Deposition

2013 ◽  
Vol 52 (11R) ◽  
pp. 110123 ◽  
Author(s):  
Meng Yang ◽  
Susumu Takabayashi ◽  
Shuichi Ogawa ◽  
Hiroyuki Hayashi ◽  
Radek Ješko ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon

Synthesis of diamond-like carbon films on Si substrates by photoemission-assisted plasma-enhanced chemical vapor deposition

2012 ◽  
Vol 523 ◽  
pp. 25-28 ◽  
Author(s):  
Meng Yang ◽  
Shuichi Ogawa ◽  
Susumu Takabayashi ◽  
Taiichi Otsuji ◽  
Yuji Takakuwa
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Si Substrates

Deposition of TiN, TiC, and DLC Coatings by PACVD

2018 ◽  
pp. 381-402
Author(s):  
Mahboobeh Azadi
Keyword(s):  
Vapor Deposition ◽  
Materials Science ◽  
Chemical Vapor ◽  
Industrial Applications ◽  
Hard Coatings ◽  
Diamond Like Carbon ◽  
Functional Coatings ◽  
Dlc Coatings ◽  
Medical Instruments ◽  
Source Of Information

In this chapter, the author studied about titanium nitride (TiN), titanium carbide (TiC), diamond like carbon (DLC) single and multilayer coatings that utilize in harsh environments. These hard coatings were usually produced by the plasma assisted chemical vapor deposition (PACVD) method as a modern technique. PACVD is used to deposit thin coatings for different usages such as computer disc drives, automobile and aerospace parts, surgical/medical instruments and the food industry. The author tried to delineate the state of the performance of different coating systems and layer characteristics that suitable either for laboratory -scales or industrial applications. Mechanical features of these coatings contain the hardness, the toughness, the wear resistance and structural properties that were perused. Consequently, this chapter offers a source of information for those who want to familiarize with the knowledge in the area of materials science of functional coatings that was produced by new plasma-based technologies.

scholarly journals Photocatalytic Activity of Hierarchically Structured TiO2Films Synthesized by Chemical Vapor Deposition

2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
Heon Lee ◽  
Sung Hoon Park ◽  
Young-Kwon Park ◽  
Sun-Jae Kim ◽  
Byung-Hoon Kim ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Chemical Vapor Deposition ◽  
Film Thickness ◽  
Hierarchical Structure ◽  
Vapor Deposition ◽  
Deposition Time ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Hierarchically structured TiO2photocatalyst films were synthesized using low-pressure metal-organic chemical vapor deposition (LPMOCVD) method to examine their photocatalytic activity. The thickness of the TiO2films increased proportionally with increasing deposition time. The TiO2film synthesized at 773 K showed a hierarchical structure composed of vertically grown laminar (112)-oriented anatase crystals. With increasing deposition time, the grain became larger and the morphology became sharper. In the initial CVD stage, small particular crystals were formed, above which sequential growth of layers of columnars with increasing size took place, forming hierarchical structure. The hierarchically structured TiO2film exhibited much higher photocatalytic activity than unhierarchically structured TiO2film. The photocatalytic activity increased with increasing film thickness.

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