Hydrogen-Radical Annealing of Chemical Vapor-Deposited Amorphous Silicon Films

1990 ◽  
Vol 29 (Part 2, No. 12) ◽  
pp. L2171-L2173 ◽  
Author(s):  
Yasutaka Uchida ◽  
Hiroshi Kanoh ◽  
Osamu Sugiura ◽  
Masakiyo Matsumura
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Hydrogen Radical

Characterization of Chemical-Vapor-Deposited Amorphous-Silicon Films

1993 ◽  
Vol 32 (Part 2, No.1A/B) ◽  
pp. L20-L23 ◽  
Author(s):  
Toshiaki Shiraiwa ◽  
Osamu Sugiura ◽  
Hiroshi Kanoh ◽  
Norihito Asai ◽  
Koh-ichi Usami ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Chemical Vapor Deposited

Characterization of hydrogenation and dehydrogenation of post‐plasma treated low‐pressure chemical‐vapor‐deposited amorphous silicon films

1987 ◽  
Vol 62 (9) ◽  
pp. 3740-3746 ◽  
Author(s):  
Minoru Nakamura ◽  
Toshiyuki Ohno ◽  
Nobutake Konishi ◽  
Kenji Miyata ◽  
Norimasa Kamezawa
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Density of gap states in chemical‐vapor‐deposited hydrogenated amorphous silicon films

1986 ◽  
Vol 59 (9) ◽  
pp. 3122-3125 ◽  
Author(s):  
T. L. Chu ◽  
Shirley S. Chu ◽  
S. T. Ang ◽  
A. Duong ◽  
C. G. Hwuang
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Gap States ◽  
Hydrogenated Amorphous
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