Deposition of Low Hydrogen Content Silicon Nitride Film Using High-Intensity Vacuum Ultraviolet Light Source in Windowless Photochemical Vapor Deposition Reactor

1992 ◽  
Vol 31 (Part 1, No. 12A) ◽  
pp. 3972-3975 ◽  
Author(s):  
Tomo Ueno ◽  
Hiroshi Nagayoshi ◽  
Haruji Morinaka ◽  
Koichi Kuroiwa ◽  
Yasuo Tarui
Keyword(s):  
Silicon Nitride ◽  
Light Source ◽  
Ultraviolet Light ◽  
Hydrogen Content ◽  
Vapor Deposition ◽  
High Intensity ◽  
Vacuum Ultraviolet ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Photochemical Vapor Deposition

High-Intensity Vacuum Ultraviolet Light Source in Windowless Photochemical Vapor Deposition Reactor and Its Application to a-Si:H Deposition

1992 ◽  
Vol 31 (Part 2, No. 4B) ◽  
pp. L518-L520 ◽  
Author(s):  
Koichi Kuroiwa ◽  
Hiroshi Yamazaki ◽  
Satoshi Tsuchiya ◽  
Koichi Kamisako ◽  
Yasuo Tarui
Keyword(s):  
Light Source ◽  
Ultraviolet Light ◽  
Vapor Deposition ◽  
High Intensity ◽  
Vacuum Ultraviolet ◽  
Photochemical Vapor Deposition

Silicon Nitride Film Deposition by Photochemical Vapor Deposition Using an Argon Excimer Lamp

2007 ◽  
Vol 46 (6A) ◽  
pp. 3534-3536 ◽  
Author(s):  
Yoshinari Maezono ◽  
Kiyohiko Toshikawa ◽  
Kou Kurosawa ◽  
Kouichi Amari ◽  
Sou Ishimura ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Vapor Deposition ◽  
Film Deposition ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Excimer Lamp ◽  
Photochemical Vapor Deposition

Plasma-enhanced chemical-vapor deposition of silicon nitride film for high resistance to potential-induced degradation

2015 ◽  
Vol 54 (8S1) ◽  
pp. 08KD12 ◽  
Author(s):  
Ken Mishina ◽  
Atsufumi Ogishi ◽  
Kiyoshi Ueno ◽  
Sachiko Jonai ◽  
Norihiro Ikeno ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
High Resistance ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nitride Film ◽  
Silicon Nitride Film
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