Control of Orientation for Polycrystalline Silicon Thin Films Fabricated from Fluorinated Source Gas by Microwave Plasma Enhanced Chemical Vapor Deposition
1998 ◽
Vol 37
(Part 2, No. 9A/B)
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pp. L1026-L1029
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1987 ◽
Vol 5
(4)
◽
pp. 1903-1904
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2006 ◽
Vol 45
(8A)
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pp. 6342-6345
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2001 ◽
Vol 148
(3)
◽
pp. C149
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2006 ◽
Vol 352
(9-20)
◽
pp. 1008-1010
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2002 ◽
Vol 41
(Part 1, No. 2A)
◽
pp. 501-506
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2000 ◽
Vol 18
(1)
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pp. 51-57
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