GaAsP pn Diode on Si Substrate Grown by Metalorganic Molecular Beam Epitaxy for Visible Light-Emitting Devices

2001 ◽  
Vol 40 (Part 1, No. 6A) ◽  
pp. 3953-3959 ◽  
Author(s):  
Masahiro Yoshimoto ◽  
Mitsunari Itoh ◽  
Junji Saraie ◽  
Toshiyuki Yasui ◽  
Sanghoon Ha ◽  
...  
1998 ◽  
Vol 535 ◽  
Author(s):  
M. Yoshimoto ◽  
J. Saraie ◽  
T. Yasui ◽  
S. HA ◽  
H. Matsunami

AbstractGaAs1–xPx (0.2 <; x < 0.7) was grown by metalorganic molecular beam epitaxy with a GaP buffer layer on Si for visible light-emitting devices. Insertion of the GaP buffer layer resulted in bright photoluminescence of the GaAsP epilayer. Pre-treatment of the Si substrate to avoid SiC formation was also critical to obtain good crystallinity of GaAsP. Dislocation formation, microstructure and photoluminescence in GaAsP grown layer are described. A GaAsP pn junction fabricated on GaP emitted visible light (˜1.86 eV). An initial GaAsP pn diode fabricated on Si emitted infrared light.


1993 ◽  
Vol 32 (Part 2, No. 12A) ◽  
pp. L1725-L1727 ◽  
Author(s):  
Masayuki Imaizumi ◽  
Yasuyuki Endoh ◽  
Ken-ichi Ohtsuka ◽  
Toshiro Isu ◽  
Masahiro Nunoshita

2001 ◽  
Vol 17 (1-2) ◽  
pp. 65-69 ◽  
Author(s):  
W.-X. Ni ◽  
C.-X. Du ◽  
F. Duteil ◽  
A. Elfving ◽  
G.V. Hansson

1989 ◽  
Vol 161 ◽  
Author(s):  
D.L. Mathine ◽  
J. Han ◽  
M. Kobayashi ◽  
R.L. Gunshor ◽  
D.R. Menke ◽  
...  

ABSTRACTA series of pseudomorphic ZnTe/AlSb/GaSb epilayer/epilayer heterostructures, aimed at the realization of novel wide bandgap light emitting devices, were grown by molecular beam epitaxy. The low temperature photoluminescence (PL) spectra of ZnTe epilayers showed dominant near-band-edge features related to free, and shallow impurity bound excitons. The PL could be seen at room temperature. Both GaSb and AlSb were doped n-type using a PbSe source.


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