Characterization of Nickel-Silicide Dependence on the Substrate Dopants for Nanoscale Complementary Metal Oxide Semiconductor Technology

2004 ◽  
Vol 43 (1) ◽  
pp. 91-95 ◽  
Author(s):  
Mi-Suk Bae ◽  
Hee-Hwan Ji ◽  
Hun-Jin Lee ◽  
Soon-Young Oh ◽  
Bin-Feng Huang ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Complementary Metal Oxide Semiconductor ◽  
Nickel Silicide ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Semiconductor Technology

Characterization of High-Performance Polycrystalline Silicon Complementary Metal–Oxide–Semiconductor Circuits

2007 ◽  
Vol 46 (1) ◽  
pp. 51-55 ◽  
Author(s):  
Genshiro Kawachi ◽  
Yoshiaki Nakazaki ◽  
Hiroyuki Ogawa ◽  
Masayuki Jyumonji ◽  
Noritaka Akita ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Polycrystalline Silicon ◽  
High Performance ◽  
Complementary Metal Oxide Semiconductor ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Semiconductor Circuits

Soft Error Hardened Memory Design for Nanoscale Complementary Metal Oxide Semiconductor Technology

2015 ◽  
Vol 64 (2) ◽  
pp. 596-602 ◽  
Author(s):  
Jing Guo ◽  
Liyi Xiao ◽  
Tianqi Wang ◽  
Shanshan Liu ◽  
Xu Wang ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Complementary Metal Oxide Semiconductor ◽  
Metal Oxide Semiconductor ◽  
Soft Error ◽  
Oxide Semiconductor ◽  
Semiconductor Technology ◽  
Memory Design
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