Threshold Voltage Modulation Technique using Fluorine Treatment through Atomic Layer Deposition TiN Suitable for Complementary Metal–Oxide–Semiconductor Devices
2008 ◽
Vol 47
(4)
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pp. 2345-2348
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2011 ◽
Vol 14
(5)
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pp. G27
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2008 ◽
Vol 47
(4)
◽
pp. 2464-2467
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2008 ◽
Vol 26
(3)
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pp. 1178
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2009 ◽
Vol 48
(4)
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pp. 04C009
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