Simulation of Nanoscale Two-Bit Not-And-type Silicon–Oxide–Nitride–Oxide–Silicon Nonvolatile Memory Devices with a Separated Double-Gate Fin Field Effect Transistor Structure Containing Different Tunneling Oxide Thicknesses
2019 ◽
Vol 7
(26)
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pp. 7865-7871
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2010 ◽
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pp. H134
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2006 ◽
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pp. 1266
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pp. 6156-6162
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2004 ◽
Vol 43
(4B)
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pp. 2207-2210
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