Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl[sub 4], SiH[sub 4], and N[sub 2]/H[sub 2]/Ar Plasma

2004 ◽  
Vol 7 (8) ◽  
pp. C87 ◽  
Author(s):  
Jin-Seong Park ◽  
Sang-Won Kang
Keyword(s):  
Silicon Nitride ◽  
Ar Plasma ◽  
Titanium Silicon Nitride ◽  
Titanium Silicon

scholarly journals Reactions of d0 alkylidene and amide complexes with silanes

2001 ◽  
Vol 73 (2) ◽  
pp. 331-335 ◽  
Author(s):  
Jonathan B. Diminnie ◽  
Xiaozhan Liu ◽  
Hu Cai ◽  
Zhongzhi Wu ◽  
Jaime R. Blanton ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Initial Attack ◽  
Amide Nitrogen ◽  
Group 4 ◽  
Titanium Silicon Nitride ◽  
Titanium Silicon

Reactions of silanes with d0 Ta alkylidene and Group 4 amide complexes were found to involve the initial attack on silicon atoms in the silanes by nucleophilic alkylidene carbon or amide nitrogen atoms. The reaction of (Me3SiCH2) 3Ta (PMe 3) [=CHSiMe3] (1) with H2SiR'Ph (R' = Me, Ph) gave (Me3SiCH2) 3Ta[=C (SiMe 3) SiHR'Ph] (2a-b). Similar reactions of these two silanes and (H2PhSi) 2CH2 with (Me3SiCH2) Ta (PMe3) 2[=CHR]2 (R = SiMe3, 3; CMe3, 4) yielded novel metallasilacyclobutadienes and a metalladisilacyclohexadiene, respectively. In comparison, the reactions between M (NMe2) 4 (M = Ti, Zr, Hf) and silanes were found to give aminosilanes and metal amide hydride species which were perhaps involved in the formation of titanium-silicon-nitride (Ti-Si-N) ternary materials.

Investigation of structural network and mechanical properties of Titanium silicon nitride (TiSiN) thin films

2018 ◽  
Vol 731 ◽  
pp. 347-353 ◽  
Author(s):  
Spandan Guha ◽  
Soham Das ◽  
Asish Bandyopadhyay ◽  
Santanu Das ◽  
Bibhu P. Swain
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Silicon Nitride ◽  
Structural Network ◽  
Titanium Silicon Nitride ◽  
Titanium Silicon
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