Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectric and metal gate electrode

2004 ◽  
Vol 48 (10-11) ◽  
pp. 1987-1992 ◽  
Author(s):  
Shiyang Zhu ◽  
H.Y. Yu ◽  
J.D. Chen ◽  
S.J. Whang ◽  
J.H. Chen ◽  
...  
2019 ◽  
Vol 2 (1) ◽  
pp. 41-48
Author(s):  
Rosa María Luna-Sánchez ◽  
Ignacio González-Martínez

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