scholarly journals Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon

2011 ◽  
Vol 158 (5) ◽  
pp. G108 ◽  
Author(s):  
J. M. Rafí ◽  
M. Zabala ◽  
O. Beldarrain ◽  
F. Campabadal
Keyword(s):  
Thermal Annealing ◽  
Deposition Temperature ◽  
Atomic Layer ◽  
Electrical Characteristics ◽  
Annealing Effects ◽  
Al2o3 Films

Thermal Annealing Effects on the Atomic Layer Deposited LaAlO[sub 3] Thin Films on Si Substrate

2008 ◽  
Vol 11 (7) ◽  
pp. G33 ◽  
Author(s):  
Dail Eom ◽  
Cheol Seong Hwang ◽  
Hyeong Joon Kim ◽  
Mann-Ho Cho ◽  
K. B. Chung
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Atomic Layer ◽  
Si Substrate ◽  
Annealing Effects

Filling performance and electrical characteristics of Al2O3 films deposited by atomic layer deposition for through-silicon via applications

2014 ◽  
Vol 556 ◽  
pp. 560-565 ◽  
Author(s):  
Kyeong-Keun Choi ◽  
Jong Kee ◽  
Si-Hong Kim ◽  
Myung-Soo Park ◽  
Chan-Gyung Park ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Electrical Characteristics ◽  
Through Silicon Via ◽  
Layer Deposition ◽  
Al2o3 Films

Effect of chemical surface treatments on interfacial and electrical characteristics of atomic-layer-deposited Al2O3 films on Ge substrates

2011 ◽  
Vol 257 (10) ◽  
pp. 4589-4592 ◽  
Author(s):  
Xuefei Li ◽  
Aidong Li ◽  
Xiaojie Liu ◽  
Youpin Gong ◽  
Xiaochun Chen ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Surface Treatments ◽  
Electrical Characteristics ◽  
Chemical Surface ◽  
Al2o3 Films
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