Effect of Particle Deposition and Wet/Dry Cleaning Methods on Particle Removal Efficiency

2019 ◽  
Vol 11 (2) ◽  
pp. 361-367 ◽  
Author(s):  
Tae-Gon Kim ◽  
Shan Hu ◽  
Ahmed A. Busnaina ◽  
Jin-Goo Park

2010 ◽  
Vol 13 (3) ◽  
pp. 67-75
Author(s):  
Thang Xuan Dinh ◽  
Trung Thanh Nguyen

Finding suitable method for selecting the most suitable dust collector for manufacturers is a very important practise which help to reduce environmental pollution and develop a stable society. Based on available research results, the article studies the efficiency of dust removal technique for medium and small scale workshops on three equipments: wet scrubber, wet packed scrubber and centriscrub to suggest suitable dust treatment process in factories as well as the present need. The research result on three equipments suggest that the wet packed scrubber has a minimum particle removal efficiency of 92,67% while the wet scrubber achieving removal efficiency of 81,85% and the Centriscrub achieving removal efficiency up to 99,50%. The results show that the wet cleaning methods is the most suitable method for safe and efficient collection of dusts from various metal working applications such as deburring, polishing and grinding workshop in which the centriscrub achieves the highest efficiency.


2021 ◽  
Vol 314 ◽  
pp. 222-227
Author(s):  
Yukifumi Yoshida ◽  
Katsuya Akiyama ◽  
Song Zhang ◽  
Dai Ueda ◽  
Masaki Inaba ◽  
...  

Wet cleaning has become challenging as the feature size of semiconductor devices decreased to sub-5 nm nodes. One of the key challenges is removing various types and sizes of particles and contamination from complex and fragile 3D structures without pattern damage and film loss. Conventional physical cleaning methods, such as dual-fluid spray or megasonic cleaning, are being used for the particle removal process. However, in advanced device nodes, these methods induce pattern damage and film loss. In this paper, we describe a novel particle removal technology called Nanolift which uses a polymer film consisting of two organic resins with different functions and achieved high particle removal efficiency on various types and sizes of particles with no pattern damage and minimum film loss.


2012 ◽  
Vol 187 ◽  
pp. 269-272 ◽  
Author(s):  
Don Dussault ◽  
F. Fournel ◽  
V. Dragoi

Current work describes development, testing and verification of a single wafer megasonic cleaning method utilizing a transducer design that meets the extreme particle neutrality, Particle Removal Efficiency (PRE), and repeatability requirements of production scale wafer bonding and other applications requiring extremely low particle levels.


2018 ◽  
Vol 50 (5) ◽  
pp. 665-672 ◽  
Author(s):  
Sarim Ahmed ◽  
Hassan Mohsin ◽  
Kamran Qureshi ◽  
Ajmal Shah ◽  
Waseem Siddique ◽  
...  

2019 ◽  
Vol 81 (3) ◽  
Author(s):  
Anita Kusuma Wardani ◽  
Ivan Ivan ◽  
Ivan Ruben Darmawan ◽  
Khoiruddin Khoiruddin ◽  
I Gede Wenten

The air quality in the world has been worsening in the last decades due to industrial, vehicle, cigarettes smoke, forest fire, and fuel usage. In this case, fine particles are the world’s greatest concern due to its aerodynamic properties which enable it to travel throughout the world. The current conventional technologies seem to have lost their reliability due to complexity, low removal efficiency, and high equipment cost. Membrane air filter brings new hope to answer this challenge. It gives high removal efficiency with an acceptable pressure drop to fulfill the need for clean air at a lower price. Recently, the introduction of nanofibre membrane as a low-cost membrane may broaden membrane application in air filtration. Compared to conventional membrane, nanofibre membrane offers some interesting features such as higher porosity, interconnected pore structure, and narrow pore size distribution that provide remarkable permeability. In this paper, the microporous polymeric membrane for air filtration especially for fine particles removal is reviewed including mechanism of fine particle removal, membrane preparation, and factor affecting filtration performance.


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