Unipolar Resistive Switching Characteristic of Double-Layer ZrO2 Memory Device

2012 ◽  
2016 ◽  
Vol 360 ◽  
pp. 338-341 ◽  
Author(s):  
Lei Zhang ◽  
Haiyang Xu ◽  
Zhongqiang Wang ◽  
Hao Yu ◽  
Jiangang Ma ◽  
...  

2017 ◽  
Vol 19 (29) ◽  
pp. 18988-18995 ◽  
Author(s):  
Sungjun Kim ◽  
Yao-Feng Chang ◽  
Min-Hwi Kim ◽  
Suhyun Bang ◽  
Tae-Hyeon Kim ◽  
...  

Here we demonstrate low-power resistive switching in a Ni/SiNy/SiNx/p++-Si device by proposing a double-layered structure (SiNy/SiNx), where the two SiN layers have different trap densities.


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