Atomic Layer Deposition (ALD) of Ultra-Thin Diffusion Barriers on ZnSe Microparticles for Phase Stability in Chalcogenide Glasses for Mid-Infrared Optics

2021 ◽  
Vol MA2021-02 (29) ◽  
pp. 873-873
Author(s):  
Jaynlynn Sosa ◽  
Matthieu Chazot ◽  
Corbin Feit ◽  
Alexandros Kostogiannes ◽  
Myungkoo Kang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Phase Stability ◽  
Chalcogenide Glasses ◽  
Atomic Layer ◽  
Diffusion Barriers ◽  
Mid Infrared ◽  
Infrared Optics ◽  
Layer Deposition

Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers

2006 ◽  
Vol 89 (3) ◽  
pp. 031915 ◽  
Author(s):  
P. F. Carcia ◽  
R. S. McLean ◽  
M. H. Reilly ◽  
M. D. Groner ◽  
S. M. George
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gas Diffusion ◽  
Diffusion Barriers ◽  
Layer Deposition

Gas diffusion barriers on polymers using Al2O3 atomic layer deposition

2006 ◽  
Vol 88 (5) ◽  
pp. 051907 ◽  
Author(s):  
M. D. Groner ◽  
S. M. George ◽  
R. S. McLean ◽  
P. F. Carcia
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gas Diffusion ◽  
Diffusion Barriers ◽  
Layer Deposition

TaC x Thin Films Prepared by Atomic Layer Deposition as Diffusion Barriers for Cu Metallization

2013 ◽  
Vol 97 (1) ◽  
pp. 127-134 ◽  
Author(s):  
Tae Eun Hong ◽  
Tae-Ho Kim ◽  
Jae-Hun Jung ◽  
Soo-Hyun Kim ◽  
Hoon Kim
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Diffusion Barriers ◽  
Cu Metallization ◽  
Layer Deposition

scholarly journals UV-enhanced atomic layer deposition of Al2O3 thin films at low temperature for gas-diffusion barriers

RSC Advances ◽  
2017 ◽  
Vol 7 (10) ◽  
pp. 5601-5609 ◽  
Author(s):  
Kwan Hyuck Yoon ◽  
Hongbum Kim ◽  
Yong-Eun Koo Lee ◽  
Nabeen K. Shrestha ◽  
Myung Mo Sung
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Diffusion Barrier ◽  
Deposition Temperature ◽  
Atomic Layer ◽  
Gas Diffusion ◽  
Diffusion Barriers ◽  
Layer Deposition ◽  
Low Deposition Temperature

We present UV-ALD as a promising approach to fabricate effective gas-diffusion barrier thin films at low deposition temperature (40 °C).

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