Opportunities for Materials Analysis with Next Generation Synchrotron Sources

1991 ◽  
Vol 35 (A) ◽  
pp. 329-332
Author(s):  
Michael Hart

AbstractPolycrystalline and powder diffraction is the most commonly practised method of x-ray analysis. During the last decade the construction of dedicated synchrotron radiation sources has resulted in the renaissance of these x-ray analysis methods; ab initio structure analysis and refinement, quantitative analysis of the structure, composition and stress in thin films and on surfaces, have all been improved. New techniques providing extremely high resolution, using anomalous dispersion, diffraction and scattering at grazing incidence to control x-ray penetration depth, have been developed. This brief review of work with W. Parrish at Stanford Synchrotron Radiation Laboratory and R. J. Cernik at the Daresbury Synchrotron Radiation Source is extended to indicate how third generation sources might be exploited in materials science.

2020 ◽  
Vol 11 (28) ◽  
pp. 4630-4638 ◽  
Author(s):  
Li Xiang ◽  
Wonyeong Ryu ◽  
Jehan Kim ◽  
Moonhor Ree

Quantitative grazing incidence X-ray scattering analysis combined with X-ray reflectivity using synchrotron radiation sources was explored for the first time cyclic topology effects on the nanoscale film morphology of poly(ε-caprolactone).


1991 ◽  
Vol 35 (B) ◽  
pp. 807-812
Author(s):  
Hideki Hashimoto ◽  
Hiroshi Nishioji ◽  
Hideo Saisho

AbstractReflection and fluorescence intensity profile curves for thin films were measured under the grazing incidence conditions using synchrotron radiation. A titanium layer and a carbon / titanium bilayer sputtered on a silicon wafer were subjected to heat treatment. The analysis of the reflection and fluorescence profile curves shows that the sample without the heat treatment has another high-density layer on the surface or interface, and that the heat treatment results in the removal of the high-density layer and the formation of a thick homogeneous layer.


1998 ◽  
Vol 524 ◽  
Author(s):  
G. F. Lorusso ◽  
H. Solak ◽  
S. Singh ◽  
P. J. Batson ◽  
J. H. Underwood ◽  
...  

ABSTRACTWe present recent results obtained by MAXIMUM at the Advanced Light Source (ALS), at the Lawrence Berkeley National Laboratory. MAXIMUM is a scanning photoemission microscope, based on a multilayer coated Schwarzschild objective. An electron energy analyzer collects the emitted photoelectrons to form an image as the sample itself is scanned. The microscope has been purposely designed to take advantage of the high brightness of the third generation synchrotron radiation sources, and it installation at ALS has been recently completed. The spatial resolution of 100 nm and the spectral resolution of 200 meV make our instrument an extremely interesting tool to investigate current problems in opto- and microelectronics. In order to illustrate the potential of MAXIMUM in these fields, we report new results obtained by studying the electromigration in Al-Cu lines and the Al segregation in AIGaN thin films.


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