Fabrication Characteristics of Al2O3 pH-Ion Sensitive Field Effect Transistor Fabricated Using Atomic Layer Deposition and Sputter
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2018 ◽
Vol 427
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pp. 1199-1202
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2011 ◽
Vol 51
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pp. 011101
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2005 ◽
Vol 49
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pp. 790-794
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2010 ◽
Vol 49
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pp. 04DA16
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