Optimum lens aperture in phase-shifting speckle interferometric setups for maximum accuracy of phase measurement

1997 ◽  
Vol 36 (25) ◽  
pp. 6217 ◽  
Author(s):  
Thomas Maack ◽  
Richard Kowarschik ◽  
Gunther Notni
Microscopy ◽  
2020 ◽  
Author(s):  
Kazuo Yamamoto ◽  
Satoshi Anada ◽  
Takeshi Sato ◽  
Noriyuki Yoshimoto ◽  
Tsukasa Hirayama

Abstract Phase-shifting electron holography (PS-EH) is an interference transmission electron microscopy technique that accurately visualizes potential distributions in functional materials, such as semiconductors. In this paper, we briefly introduce the features of the PS-EH that overcome some of the issues facing the conventional EH based on Fourier transformation. Then, we present a high-precision PS-EH technique with multiple electron biprisms and a sample preparation technique using a cryo-focused-ion-beam, which are important techniques for the accurate phase measurement of semiconductors. We present several applications of PS-EH to demonstrate the potential in organic and inorganic semiconductors and then discuss the differences by comparing them with previous reports on the conventional EH. We show that in situ biasing PS-EH was able to observe not only electric potential distribution but also electric field and charge density at a GaAs p-n junction and clarify how local band structures, depletion layer widths, and space charges changed depending on the biasing conditions. Moreover, the PS-EH clearly visualized the local potential distributions of two-dimensional electron gas (2DEG) layers formed at AlGaN/GaN interfaces with different Al compositions. We also report the results of our PS-EH application for organic electroluminescence (OEL) multilayers and point out the significant potential changes in the layers. The proposed PS-EH enables more precise phase measurement compared to the conventional EH, and our findings introduced in this paper will contribute to the future research and development of high-performance semiconductor materials and devices.


2011 ◽  
Vol 36 (21) ◽  
pp. 4305 ◽  
Author(s):  
Peng Gao ◽  
Baoli Yao ◽  
Irina Harder ◽  
Norbert Lindlein ◽  
Francisco Jose Torcal-Milla

1994 ◽  
Vol 1 (2) ◽  
pp. 278-280
Author(s):  
Guanming Lai ◽  
Qingxin Ru ◽  
Kazuhiro Aoyama ◽  
Akira Tonomura

Author(s):  
C Wykes ◽  
R Morshedizadeh

Moiré contouring is a technique that enables the surface topography of an object to be measured in a single view and has a wide range of potential applications in manufacturing. However, to be useful, it is necessary to be able to calibrate the system and establish the traceability of the calibration. In this paper, the factors that determine the accuracy of the technique are identified, methods of calibration proposed and attainable accuracies estimated. These include the optical magnification, phase measurement and sensitivity, all of which contribute to measurement errors in the technique. The methods are illustrated with results from a digital moiré system, and the improvements required to obtain maximum accuracy are outlined.


1994 ◽  
Author(s):  
Haruhiko Kusunose ◽  
Hiroyuki Nakae ◽  
Junji Miyazaki ◽  
Nobuyuki Yoshioka ◽  
Hiroaki Morimoto ◽  
...  

2016 ◽  
Vol 24 (13) ◽  
pp. 13744 ◽  
Author(s):  
Linbo Huang ◽  
Xiaoxu Lu ◽  
Jiaosheng Li ◽  
Yunfei Zhou ◽  
Jiaxiang Xiong ◽  
...  

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