Resonant Microwave Absorption in an Overdense Plasma Column

1980 ◽  
Vol 35 (3) ◽  
pp. 293-301
Author(s):  
G. Böhm

Abstract A resonant coupling mechanism is presented which leads to nearly full absorption of an electromagnetic wave in an overdense plasma column. In the resonance case a strong enhancement of the electric field strength within the plasma is found. Under certain conditions this high electric field strength causes parametric excitation of plasma waves in the underdense edges of the discharge. It turned out that the occurance of this decay process is mainly determined by the density gradients in the plasma.

2019 ◽  
Vol 6 (2) ◽  
pp. 111-114
Author(s):  
R. Kornev ◽  
P. Sennikov ◽  
V. Nazarov ◽  
A. Kut'in ◽  
A. Plekhovich

A contracted RF (40.68 MHz) arc discharge of atmospheric pressure, stabilized between two rod electrodes, was used to obtain trichlorosilane by the reaction of hydrogen reduction of silicon tetrachloride (SiCl<sub>4</sub>). In model mixtures of macro-composition in the ratio H<sub>2</sub>/SiCl<sub>4</sub>/CCl<sub>4</sub>=10/1/1, it was shown that C and SiC are the main solid-phase product which are deposited on the surface of electrodes in the form of dendrides. The temperature of the ends of the electrodes determined using emission thermometry is 1600 K. The thermodynamic analysis of H<sub>2</sub>+SiCl<sub>4</sub>+CCl<sub>4</sub> system confirms that the formation of C and SiC occurs in the temperature range of 1600 K. The deposition of solid-phase products occurs on the electrodes in the zone of high electric field strength.


2006 ◽  
Vol 3 (2) ◽  
pp. 242-245
Author(s):  
Baghdad Science Journal

In this research was conducted to provide a product to analyze the performance sensor fiber optic used to measure and feel the intensity of the electric field results showed obtained that use sensor long gives reactive high electric field strength and a high value for allergic sensor, but that is at the expense of reducing the intensity of the electric field that is detected


1995 ◽  
Vol 66 (4) ◽  
pp. 460-462 ◽  
Author(s):  
Hitoki Yoneda ◽  
Ken‐ichi Ueda ◽  
Yumi Aikawa ◽  
Kazuhiro Baba ◽  
Nobuaki Shohata

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