Topology and Photoelectric Properties of Heterostructure p-GaTe – n-InSe
Keyword(s):
We investigated the photoelectrical properties of the heterojunctions p-GaTe – n-InSe fabricated by the method of mechanical contact of GaTe oxidized plate with van der Waals surface of InSe. The AFM-images revealed that there was formed thin oxide dielectric layer of Ga2O3 on the heterointerface p-GaTe – n-InSe. The energy band diagram was constructed. It was established that the p-GaTe – n-InSe heterojunction is photosensitive in the spectral range 0,74 - 1,0 µm.
2021 ◽
Vol 1033
◽
pp. 012042
Keyword(s):
2005 ◽
Vol 152
(3)
◽
pp. C124
◽
Keyword(s):
Keyword(s):
2019 ◽
Vol 34
(12)
◽
pp. 125007
◽
Keyword(s):
Keyword(s):
2007 ◽
Vol 40
(3)
◽
pp. 241-246
◽
Keyword(s):