Correlation of stress state and nanohardness via heat treatment of nickel-aluminide multilayer thin films

2004 ◽  
Vol 19 (11) ◽  
pp. 3374-3381 ◽  
Author(s):  
Evan A. Sperling ◽  
Peter M. Anderson ◽  
Jennifer L. Hay
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Stress State ◽  
Internal Stress ◽  
Biaxial Stress ◽  
Multilayer Thin Films ◽  
Bilayer Thickness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Biaxial Stress State

Heat treatment of γ-Ni(Al)/γ′-Ni3Al multilayer thin films demonstrates that multilayer hardness correlates with the magnitude of biaxial stress in alternating layers. Films with a columnar grain morphology and (001) texture were fabricated over a range of volume fraction and bilayer thickness via direct current magnetron sputtering onto NaCl (001) substrates at 623 K. The films were removed from substrates, heat-treated at either 673 K or 1073 K in argon, and then mounted for nanoindentation and x-ray diffraction. The biaxial stress state in each phase was furnished from x-ray diffraction measurement of (002) interplanar spacings. The 673 K treatment increases the magnitude of alternating biaxial stress state by 70 to 100% and increases hardness by 25 to 100%, depending on bilayer thickness. In contrast, the 1073 K heat treatment decreases the stress magnitude by 70% and decreases hardness by 50%. The results suggest that the yield strength of these thin films is controlled, in part, by the magnitude of internal stress. Further, thermal treatments are demonstrated to be an effective means to manipulate internal stress.

Nano-Structured TiN/TiBN Multilayer Thin Films

2007 ◽  
Vol 334-335 ◽  
pp. 889-892
Author(s):  
K. Chu ◽  
Yao Gen Shen
Keyword(s):  
Thin Films ◽  
Multilayer Film ◽  
Multilayer Thin Films ◽  
Bilayer Thickness ◽  
Maximum Hardness ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Significant Relationships ◽  
Transmission Electron

Nano-structured TiN/TiBN multilayer thin films were deposited onto unheated Si(100) substrates by reactive unbalanced dc-magnetron sputtering in an Ar-N2 gas mixture at a pulsed-bias voltage of –60 V. The effects of the bilayer thickness (Λ = 1.8-7.7 nm) on microstructures and mechanical properties have been analyzed using X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), and microindentation measurements. Microstructure studies revealed that the TiN layers were fcc B1-NaCl structure comprising of (111)- and (200)-oriented grains depending on Λ, while the TiBN layers were amorphous. Significant relationships were found between hardness (H) and Λ. A maximum hardness of ~30 GPa was observed in a multilayer film with = 1.8 nm. The possible hardness enhancement mechanism was also discussed.

TEM studies of solid-state reactions in sputter-deposited Nb/Al multilayer thin films

1996 ◽  
Vol 54 ◽  
pp. 1020-1021
Author(s):  
F. Ma ◽  
S. Vivekanand ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Stoichiometric Composition ◽  
Analytical Electron Microscopy ◽  
Grain Structure ◽  
Solid State Reactions ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sputter Deposited

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.

In situ X-ray diffraction study of crystallization process of GeSbTe thin films during heat treatment

2005 ◽  
Vol 244 (1-4) ◽  
pp. 281-284 ◽  
Author(s):  
Naohiko Kato ◽  
Ichiro Konomi ◽  
Yoshiki Seno ◽  
Tomoyoshi Motohiro
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Diffraction Study ◽  
Crystallization Process ◽  
X Ray Diffraction ◽  
X Ray

Elastic Constant Measurement in Supported W/Cu Multilayer Thin Films by X-Ray Diffraction

2002 ◽  
Vol 404-407 ◽  
pp. 791-796
Author(s):  
Pascale Villain ◽  
Philippe Goudeau ◽  
Pierre Olivier Renault ◽  
K.F. Badawi
Keyword(s):  
Thin Films ◽  
Elastic Constant ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Constant Measurement

Microstructure Characterization of Si/C Multilayer Thin Films

2013 ◽  
Vol 743-744 ◽  
pp. 910-914
Author(s):  
Ting Han ◽  
Geng Rong Chang ◽  
Yun Jin Sun ◽  
Fei Ma ◽  
Ke Wei Xu
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Post Annealing ◽  
Transmission Electron ◽  
Twin Defects ◽  
Modulation Ratio

Si/C multilayer thin films were prepared by magnetron sputtering and post-annealing in N2 atmosphere at 1100 for 1h. X-ray diffraction (XRD), Raman scattering and high-resolution transmission electron microscopy (HRTEM) were applied to study the microstructures of the thin films. For the case of Si/C modulation ratio smaller than 1,interlayer diffusion is evident, which promotes the formation of α-SiC during thermal annealing. If the modulation ratio is larger than 1, the Si sublayers are partially crystallized, and the thicker the Si sublayers are, the crystallinity increases. To be excited, brick-shaped nc-Si is directly observed by HRTEM. The brick-shaped nc-Si appears to be more regular near the Si (100) substrate but with twin defects. The results are instructive in the application of solar cells.

The Ti-B-N System: Nanocomposite nc-TiN/a-(TiB2, BN) and Nano-Multilayer nc-TiN/a-TiBN Thin Films

2008 ◽  
Vol 8 (5) ◽  
pp. 2713-2718
Author(s):  
Y. H. Lu ◽  
K. Chu ◽  
Y. G. Shen
Keyword(s):  
Thin Films ◽  
Dislocation Motion ◽  
Structural Barriers ◽  
Mechanical Behaviors ◽  
Bilayer Thickness ◽  
Maximum Hardness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Grain Sizes ◽  
Transmission Electron

The nanostructures and mechanical properties of nanocomposite nc-TiN/a-(TiB2, BN) and nanostructured multilayers nc-TiN/a-TiBN were investigated using X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), microindentation, and stress measurements. It was found that the monolayer Ti-B-N thin films consisted of nanometer-sized crystalline (nc-) Ti(N, B) embedded into amorphous (a-) (TiB2, BN) matrix. When B content was below ∼16 at.%, two different-sized nanocrystallites with mean grain sizes of ∼3 and 9 nm respectively were embedded in a-TiB2. With increasing B incorporation (>∼27 at.%), more uniform nanograins was embedded a-(TiB2, BN). Incorporation of B not only decreased the size of nanocrystallites, but also gave rise to twinning deformation in nanocrystallites. A maximum hardness of ∼44 GPa was achieved at B content of 19 at.%. It was also found that the nanostructure and mechanical behaviors of nc-TiN/a-TiBN multilayers was dependent on the modulation length (bilayer thickness Λ). Decrease of Λ made the preferred orientation of nc-TiN gradually transform from (200) to (111). A maximum hardness of ∼30 GPa was achieved at Λ = 1.8 nm. Deflection from this Λ value decreased hardness. By contrast, the residual compressive stress value monotonically increased with decrease of Λ. The enhancement of the hardness was due to the coherent stresses and the structural barriers to dislocation motion in the interface.

Mastering the biaxial stress state in nanometric thin films on flexible substrates

2014 ◽  
Vol 306 ◽  
pp. 70-74 ◽  
Author(s):  
D. Faurie ◽  
P.-O. Renault ◽  
E. Le Bourhis ◽  
G. Geandier ◽  
P. Goudeau ◽  
...  
Keyword(s):  
Thin Films ◽  
Stress State ◽  
Biaxial Stress ◽  
Flexible Substrates ◽  
Biaxial Stress State

STUDY OF SUPERCONDUCTING Y-BA-CU-O THIN FILMS WITH ZERO RESISTANCE TEMPERATURE AT 77K

1987 ◽  
Vol 01 (02) ◽  
pp. 571-574
Author(s):  
Jia-qi Zheng ◽  
Guo-guang Zheng ◽  
Dong-qi Li ◽  
Wei Wang ◽  
Jin-min Xue ◽  
...  
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Electron Beam ◽  
High Vacuum ◽  
Vacuum System ◽  
X Ray Diffraction ◽  
X Ray ◽  
Zero Resistance

Y-Ba-Cu-O thin films are deposited onto severval kinds of substrates by electron beam evaporating in a high vacuum system. After the heat treatment at 850–890°c for 1hr the Y-Ba-Cu-O films on the BaF2 substrates show superconducting behaviors with the midpoint Tc around 87K and zero resistance temperature at 77K. The composition and stucture analysis of these films have been studied by AES, XRFS and x-ray diffraction.

Diffraction stress analysis of highly planar-faulted, macroscopically elastically anisotropic thin films and application to tensilely loaded nanocrystalline Ni and Ni(W)

2014 ◽  
Vol 47 (1) ◽  
pp. 291-302 ◽  
Author(s):  
Silke Julia Birgit Kurz ◽  
Udo Welzel ◽  
Ewald Bischoff ◽  
Eric Jan Mittemeijer
Keyword(s):  
Thin Films ◽  
Stress State ◽  
Stress Analysis ◽  
Biaxial Stress ◽  
Stress Factors ◽  
Group Method ◽  
Analysis Method ◽  
Biaxial Stress State ◽  
Successful Separation ◽  
Increased Strength

The presence of planar faults complicates the diffraction stress analysis enormously owing to fault-induced displacement, broadening and asymmetry of the Bragg reflections. A dedicated stress-analysis method has been developed for highly planar-faulted, fibre-textured thin films of cubic crystal symmetry, using only specific reflections for diffraction stress analysis. The effect of unjustified use of other reflections has been demonstrated in the course of application of the method to Ni and Ni(W) thin films exhibiting excessive faulting and subjected to (1) a planar, rotationally symmetric stress state and (2) a planar biaxial stress state. In case 1 the crystallite-group method has been used, whereas in case 2 the stress-analysis method based on X-ray stress factors had to be applied. The successful separation of stress- and fault-induced reflection displacements has enabled the investigation of the mechanical behaviour of Ni and Ni(W) thin films byin situstress measurements during tensile loading, thereby exposing pronounced stiffness and increased strength by alloying with W.

Surface Structural Characterization and Mechanical Testing by Nanoindentation Measurements of Hybrid Polymer/clay Nanostructured Multilayer Films

2002 ◽  
Vol 17 (7) ◽  
pp. 1622-1633 ◽  
Author(s):  
Xiaowu Fan ◽  
Mi-Kyoung Park ◽  
Chuanjun Xia ◽  
Rigoberto Advincula
Keyword(s):  
Thin Films ◽  
Quartz Crystal ◽  
Ex Situ ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Diallyldimethylammonium Chloride

Nanostructured montmorillonite/poly(diallyldimethylammonium chloride) multilayer thin films were fabricated up to 100 layers thick by stepwise alternating polyelectrolyte and clay deposition from solution. The structure and morphology of the films were characterized by x-ray diffraction, ellipsometry, atomic force microscopy, and quartz crystal microbalance ex situ and in situ measurements. The mechanical properties were tested by nanoindentation. The hardness of the multilayer thin film was 0.46 GPa. The thin film's modulus was correlated to its ordering and anisotropic structure. Both hardness and modulus of this composite film were higher than those of several other types of polymer thin films.

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