Elastic Constant Measurement in Supported W/Cu Multilayer Thin Films by X-Ray Diffraction

2002 ◽  
Vol 404-407 ◽  
pp. 791-796
Author(s):  
Pascale Villain ◽  
Philippe Goudeau ◽  
Pierre Olivier Renault ◽  
K.F. Badawi
Keyword(s):  
Thin Films ◽  
Elastic Constant ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Constant Measurement

TEM studies of solid-state reactions in sputter-deposited Nb/Al multilayer thin films

1996 ◽  
Vol 54 ◽  
pp. 1020-1021
Author(s):  
F. Ma ◽  
S. Vivekanand ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Stoichiometric Composition ◽  
Analytical Electron Microscopy ◽  
Grain Structure ◽  
Solid State Reactions ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sputter Deposited

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.

Microstructure Characterization of Si/C Multilayer Thin Films

2013 ◽  
Vol 743-744 ◽  
pp. 910-914
Author(s):  
Ting Han ◽  
Geng Rong Chang ◽  
Yun Jin Sun ◽  
Fei Ma ◽  
Ke Wei Xu
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Post Annealing ◽  
Transmission Electron ◽  
Twin Defects ◽  
Modulation Ratio

Si/C multilayer thin films were prepared by magnetron sputtering and post-annealing in N2 atmosphere at 1100 for 1h. X-ray diffraction (XRD), Raman scattering and high-resolution transmission electron microscopy (HRTEM) were applied to study the microstructures of the thin films. For the case of Si/C modulation ratio smaller than 1,interlayer diffusion is evident, which promotes the formation of α-SiC during thermal annealing. If the modulation ratio is larger than 1, the Si sublayers are partially crystallized, and the thicker the Si sublayers are, the crystallinity increases. To be excited, brick-shaped nc-Si is directly observed by HRTEM. The brick-shaped nc-Si appears to be more regular near the Si (100) substrate but with twin defects. The results are instructive in the application of solar cells.

Surface Structural Characterization and Mechanical Testing by Nanoindentation Measurements of Hybrid Polymer/clay Nanostructured Multilayer Films

2002 ◽  
Vol 17 (7) ◽  
pp. 1622-1633 ◽  
Author(s):  
Xiaowu Fan ◽  
Mi-Kyoung Park ◽  
Chuanjun Xia ◽  
Rigoberto Advincula
Keyword(s):  
Thin Films ◽  
Quartz Crystal ◽  
Ex Situ ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Diallyldimethylammonium Chloride

Nanostructured montmorillonite/poly(diallyldimethylammonium chloride) multilayer thin films were fabricated up to 100 layers thick by stepwise alternating polyelectrolyte and clay deposition from solution. The structure and morphology of the films were characterized by x-ray diffraction, ellipsometry, atomic force microscopy, and quartz crystal microbalance ex situ and in situ measurements. The mechanical properties were tested by nanoindentation. The hardness of the multilayer thin film was 0.46 GPa. The thin film's modulus was correlated to its ordering and anisotropic structure. Both hardness and modulus of this composite film were higher than those of several other types of polymer thin films.

Thermal Evolution of Magnetic Properties and Crystal Structure in Compositionally Modulated Al/Ni Thin Films

1991 ◽  
Vol 232 ◽  
Author(s):  
A. Waknis ◽  
E. Haftek ◽  
M. Tan ◽  
J. A. Barnard ◽  
E. Tsang
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Magnetic Properties ◽  
Thermal Evolution ◽  
Dead Layer ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
The Individual ◽  
Deposited Films

ABSTRACTPeriodic multilayer thin films of the form (xAl/yNi)n were grown by alternate deposition of pure Al and Ni using dc-magnetron sputtering. The thicknesses of the individual Al and Ni layers are given by x and y, respectively, and the total number of bilayer units is n. For this set of experiments, x was fixed at 3.5 nm while y was systematically varied from 2.4 to 154 nm. The films were tested in as-deposited and annealed states for magnetic properties using a vibrating sample magnetometer and for crystal structure by x-ray diffraction. In both the as-deposited and annealed samples the magnetization per unit volume of Ni declined as the Ni layer thickness decreased. This result can be interpreted in terms of a magnetically ‘dead’ layer at the Al/Ni interfaces. The width of the dead layer increased from 2.9 nm to 5.8 nm on annealing. Magnetic properties were correlated with crystal structure experiments by x-ray diffraction. As-deposited films yielded a Ni(111) texture. The Ni (111) peak decreased in intensity and broadened as the Ni thickness declined. Annealing produced evidence for the growth of the intermetallic NiAl3.

Correlation of stress state and nanohardness via heat treatment of nickel-aluminide multilayer thin films

2004 ◽  
Vol 19 (11) ◽  
pp. 3374-3381 ◽  
Author(s):  
Evan A. Sperling ◽  
Peter M. Anderson ◽  
Jennifer L. Hay
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Stress State ◽  
Internal Stress ◽  
Biaxial Stress ◽  
Multilayer Thin Films ◽  
Bilayer Thickness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Biaxial Stress State

Heat treatment of γ-Ni(Al)/γ′-Ni3Al multilayer thin films demonstrates that multilayer hardness correlates with the magnitude of biaxial stress in alternating layers. Films with a columnar grain morphology and (001) texture were fabricated over a range of volume fraction and bilayer thickness via direct current magnetron sputtering onto NaCl (001) substrates at 623 K. The films were removed from substrates, heat-treated at either 673 K or 1073 K in argon, and then mounted for nanoindentation and x-ray diffraction. The biaxial stress state in each phase was furnished from x-ray diffraction measurement of (002) interplanar spacings. The 673 K treatment increases the magnitude of alternating biaxial stress state by 70 to 100% and increases hardness by 25 to 100%, depending on bilayer thickness. In contrast, the 1073 K heat treatment decreases the stress magnitude by 70% and decreases hardness by 50%. The results suggest that the yield strength of these thin films is controlled, in part, by the magnitude of internal stress. Further, thermal treatments are demonstrated to be an effective means to manipulate internal stress.

Nano-Structured TiN/TiBN Multilayer Thin Films

2007 ◽  
Vol 334-335 ◽  
pp. 889-892
Author(s):  
K. Chu ◽  
Yao Gen Shen
Keyword(s):  
Thin Films ◽  
Multilayer Film ◽  
Multilayer Thin Films ◽  
Bilayer Thickness ◽  
Maximum Hardness ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Significant Relationships ◽  
Transmission Electron

Nano-structured TiN/TiBN multilayer thin films were deposited onto unheated Si(100) substrates by reactive unbalanced dc-magnetron sputtering in an Ar-N2 gas mixture at a pulsed-bias voltage of –60 V. The effects of the bilayer thickness (Λ = 1.8-7.7 nm) on microstructures and mechanical properties have been analyzed using X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), and microindentation measurements. Microstructure studies revealed that the TiN layers were fcc B1-NaCl structure comprising of (111)- and (200)-oriented grains depending on Λ, while the TiBN layers were amorphous. Significant relationships were found between hardness (H) and Λ. A maximum hardness of ~30 GPa was observed in a multilayer film with = 1.8 nm. The possible hardness enhancement mechanism was also discussed.

Interdiffusion in Fe/Pt Multilayer Thin Films

2006 ◽  
Vol 258-260 ◽  
pp. 199-206 ◽  
Author(s):  
Se Young O ◽  
Dan Phuong Nguyen ◽  
Chan Gyu Lee ◽  
Bon Heun Koo ◽  
Byeong Seon Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Annealing Time ◽  
Composition Gradient ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
Multilayer Systems ◽  
X Ray ◽  
Peak Intensity ◽  
Straight Line ◽  
Interdiffusion Coefficients

Interdiffusion in Fe/Pt multilayer thin films has been studied. [Fe(1nm)/Pt(1.5nm)]20 multilayers were prepared by DC magnetron sputtering technique and subsequently annealed at temperatures of 543 - 633K in vacuum lower than 10-6 torr. X-ray diffraction (XRD) studies on these multilayer systems revealed the interdiffusion coefficients from slope of the best straight line fit of first peak intensity versus annealing time. The temperature dependence of interdiffusion in the range of 543 - 633K can be described by D=4.98×10-24 exp (0.88eV/kT) m2S-1. The coercivity, measured by Vibrating Sample Magnetometer, of the multilayer with annealing time at 603K increased, which is believed to the increase of surface roughness by interdiffusion at the interfaces of Fe and Pt multilayers, enhancement of composition gradient; and/or formation of Fe-Pt reaction phase at the interface of Fe and Pt.

Structural and Elastic Properties of HF/ZR Multilayer Thin Films

1990 ◽  
Vol 187 ◽  
Author(s):  
W. J. Meng ◽  
G. L. Eesley ◽  
K. Svinarich ◽  
G. P. Meisner
Keyword(s):  
Thin Films ◽  
Elastic Properties ◽  
Elastic Constants ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
Deposition Rates ◽  
X Ray ◽  
Effective Elastic Constants

AbstractWe have investigated structural and elastic properties of Hf/Zr multilayer thin films by x-ray diffraction and transient piezoreflectance measurements. Similar structural and elastic behaviors have been observed in two series of samples grown at different deposition rates (1 – 10Å/sec). Our measurements suggest different (˜ 10%) effective elastic constants between multilayers with coherent and incoherent interfaces.

The “Hook Effect” of X-Ray Diffraction Peak Broadening of Multilayer Thin Films

1987 ◽  
Vol 2 (3) ◽  
pp. 180-182 ◽  
Author(s):  
Liu Dengfa ◽  
Wang Yuming
Keyword(s):  
Thin Films ◽  
Copper Films ◽  
Multilayer Thin Films ◽  
Size Distributions ◽  
X Ray Diffraction ◽  
X Ray ◽  
Hook Effect ◽  
Peak Broadening ◽  
Grain Size Distributions ◽  
Diffraction Peaks

AbstractThe “hook effect” observed in the Warren-Averbach analysis of X-ray diffraction peaks from multiple layer thin films of copper has been investigated theoretically and experimentally. The strengths of the “hook effect” for films of different layer thicknesses were analyzed. The results showed definite correlation between the strengths of the “hook effect” and the grain size distributions in 1, 4, and 19-layer copper films.

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