Formation of GaN Nanocrystal on Si and Its Photoelectrochemical Application

ABSTRACTGaN nanodots and nanorods were successfully grown on Si (111) substrates by molecular beam epitaxy. Photocurrent densities of GaN nanodots were quite small compared with thick GaN layer grown by metal-organic vapor phase epitaxy. The current density, however, increases with GaN nanodot density. The highest photocurrent density of the GaN nanodots was higher than that of the layer structure with similar thickness (up to 10 nm) to the nanodot height. GaN nanorods have much higher photocurrent density than that of GaN nanodots. Enough nanostructure size for light absorption is important to achieve good photoelectrochemical performance.