In-Situ Fabrication and Process Control Techniques in Rapid Thermal Processing
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AbstractAdvanced rapid thermal processing (RTP) equipment and sensors have been developed for in-situ fabrication of semiconductor devices. High-performance multi-zone lamp modules have been applied to various processes including rapid thermal oxidation (RTO), chemicalvapor deposition (CVD) of tungsten and amorphous/polycrystalline silicon, silicide formation, as well as high-temperature rapid thermal annealing (RTA). Concurrent use of multizone lamps and multi-point temperature sensors allows real-time wafer temperature control and process uniformity optimization. Specific experimental results will be presented on the multi-zone lamp modules, in-situ process control sensors, and single-wafer fabrication processes.
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2017 ◽
Vol 802
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pp. 48-56
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2019 ◽
Vol 787
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pp. 1110-1119
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1991 ◽
Vol 34
(2)
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pp. 181-184
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