Load- and Depth-Sensing Indentation Tester for Properties Measurement at Non-Ambient Temperatures

1993 ◽  
Vol 308 ◽  
Author(s):  
Karl B. Yoder ◽  
Donald S. Stone

ABSTRACTThe ability to measure the temperature-dependence of the hardness of thin films is useful from both an applications and a scientific standpoint. For this reason, we have designed and constructed a load- and depth-sensing indentation tester combining sub-nanometer resolution with the ability to operate over a range of temperatures, currently 150K to 400K. This paper describes the new experimental apparatus and reports preliminary data on 440C stainless steel substrates with and without a 0.75 μm ZrN coating.

2008 ◽  
Vol 2008 ◽  
pp. 1-5 ◽  
Author(s):  
E. Barrera-Calva ◽  
J. Méndez-Vivar ◽  
M. Ortega-López ◽  
L. Huerta-Arcos ◽  
J. Morales-Corona ◽  
...  

Silica-copper oxide (silica-CuO) composite thin films were prepared by a dipping sol-gel route using ethanolic solutions comprised TEOS and a copper-propionate complex. Sols with different TEOS/Cu-propionate (Si/Cu) molar ratios were prepared and applied on stainless steel substrates using dipping process. During the annealing process, copper-propionate complexes developed into particulate polycrystalline CuO dispersed in a partially crystallized silica matrix, as indicated by the X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) analyses. The gel thermal analysis revealed that the prepared material might be stable up to400°C. The silica-CuO/stainless steel system was characterized as a selective absorber surface and its solar selectivity parameters, absorptance (α), and emittance (ε) were evaluated from UV-NIR reflectance data. The solar parameters of such a system were mostly affected by the thickness and phase composition of theSiO2-CuO film. Interestingly, the best solar parameters (α= 0.92 andε= 0.2) were associated to the thinnest films, which comprised a CuO-Cu2Omixture immersed in the silica matrix, as indicated by XPS.


2019 ◽  
Vol 784 ◽  
pp. 231-236 ◽  
Author(s):  
Susu Wang ◽  
Hao Wang ◽  
Jie Jian ◽  
Jianguo Chen ◽  
Jinrong Cheng

2017 ◽  
Vol 71 (8) ◽  
pp. 1990-2000 ◽  
Author(s):  
José L. Ruiz-Caballero ◽  
Joaquín A. Aparicio-Bolaño ◽  
Amanda M. Figueroa-Navedo ◽  
Leonardo C. Pacheco-Londoño ◽  
Samuel P. Hernandez-Rivera

2006 ◽  
Vol 201 (6) ◽  
pp. 2431-2437 ◽  
Author(s):  
Rosa M.R. Junqueira ◽  
Margareth S. Andrade ◽  
Célia R.O. Loureiro ◽  
Vicente T.L. Buono

1996 ◽  
Vol 290-291 ◽  
pp. 264-270 ◽  
Author(s):  
N. Bertrand ◽  
B. Drévillon ◽  
J.E. Klemberg-Sapieha ◽  
L. Martinu

2006 ◽  
Vol 125 (2) ◽  
pp. 382-386 ◽  
Author(s):  
Takaaki Suzuki ◽  
Isaku Kanno ◽  
Jacob J. Loverich ◽  
Hidetoshi Kotera ◽  
Kiyotaka Wasa

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