scholarly journals Sputter Deposition of Nanocones for Field Emission

1997 ◽  
Vol 471 ◽  
Author(s):  
Alan F. Jankowski ◽  
Jeffrey P. Hayes

ABSTRACTDeposition into micron-sized holes is known to produce cone shapes as supported on substrates. Potential uses for the cones include field-forming devices as field ionizers and field emission cathodes. The application of such devices include flat panel displays and flash x-ray tubes. Process iterations to closely space arrays of sharp cones have been extensively documented during the past two decades using the physical vapor deposition method of evaporation. Sputter deposition is well known as a method to fill holes and trenches but has only recently been demonstrated as an alternative method to produce field emission cathodes. In a further reduction in size, we have been successful in demonstrating the ability to deposit a cone shape into a cavity with a 300nm diameter hole. Through comparison to the results of electron-beam evaporative deposition, a sputter deposited nanocone appears to be suitable for use as a field emission cathode.

2020 ◽  
Vol 12 (2) ◽  
pp. 99-110
Author(s):  
K.M. Aung ◽  
E.P. Sheshin ◽  
Y.M. Htwe ◽  
W.Z. Hlaing ◽  
H.W. Aung

1998 ◽  
Vol 509 ◽  
Author(s):  
A. A. Talin ◽  
B. Chalamala ◽  
B. F. Coll ◽  
J. E. Jaskie ◽  
R. Petersen ◽  
...  

Over the past few years, Motorola, as well as several other companies around the world, have been developing a new type of flat panel display, called the field emission display (FED). The FED combines many of the advantages of its cousin, the cathode ray tube (CRT), including high brightness and contrast, wide angle viewability, and speed in a flat package that is only a few millimeters thick. A 14 cm diagonal FED prototype built at Motorola Flat Panel Display Division is shown below, in Figure 1.


2009 ◽  
Vol 24 (8) ◽  
pp. 2503-2510 ◽  
Author(s):  
Jun-Peng Lei ◽  
Xing-Long Dong ◽  
Fu-Guo Zhao ◽  
Hao Huang ◽  
Xue-Feng Zhang ◽  
...  

Nanometer-sized intermetallic Mg-Ni and Mg-Cu compound powders were prepared by a physical vapor deposition method (arc discharge) and characterized by means of x-ray diffraction and transmission electron microscopy. Based on an empirical specific heat equation, the effective heat of formation and its temperature dependence were calculated to explain phase formation in nanoscale powders of the binary Mg-Ni and Mg-Cu systems. It is shown that theoretic calculations are in good agreement with the experimental observations.


2013 ◽  
Vol 6 (10) ◽  
pp. 105102 ◽  
Author(s):  
Yusuke Iwai ◽  
Kazuo Muramatsu ◽  
Shougo Tsuboi ◽  
Atsuo Jyouzuka ◽  
Tomonori Nakamura ◽  
...  

2019 ◽  
Vol 89 (12) ◽  
pp. 1836
Author(s):  
Н.А. Дюжев ◽  
Г.Д. Демин ◽  
Н.А. Филиппов ◽  
И.Д. Евсиков ◽  
П.Ю. Глаголев ◽  
...  

Abstract The technological prospects for the creation of a system of microfocus X-ray tubes with the use of silicon field emission of nanocathodes have been discussed. A numerical analysis of the field-emission current from a nanoscale semiconductor cathode regulated by voltage on a grid electrode has been carried out on the basis of which a scheme for controlling the elements of the matrix of field-emission cathode assemblies has been proposed. The current–voltage characteristics of silicon field emission nanocathodes have been measured. They are in good agreement with the theoretical estimates of the field-emission current. A full technological cycle of the development of elements of microfocus X-ray tubes (a set of field-emission cathode assemblies and a set of anode assemblies) has been performed. The results can be used to create systems of microfocus X-ray tubes for nanolithographic equipment of a new generation.


2001 ◽  
Vol 685 ◽  
Author(s):  
A.G Chakhovskoi ◽  
N.N Chubun ◽  
C.E. Hunt ◽  
A.N Obraztsov ◽  
A.P. Volkov

AbstractPlanar field-emission cathode structures consisting of nanostructured carbon flakes have been investigated as an electron source for flat panel display application.Layers of nanoflakes were grown on silicon and molybdenum substrates using a high- temperature pyrolitic plasma-assisted CVD method. The result is a vertically oriented nanocluster layer of 1-2 micrometer height chemically bonded with the substrates. Additional orientation of the flakes, occurring during the first activation of the cathodes, was observed.Field emission properties of the emitters were studied in a vacuum chamber and in sealed flat-panel prototype devices with non-patterned low-voltage phosphor screens. Emitters with an area up to 1 square inch were tested under DC currents up to 100 microamps in diode mode. Anode bias up to 1.5 kV was applied. Current fluctuations of 1-2% were achieved using loading resistor.


1997 ◽  
Vol 505 ◽  
Author(s):  
N. R. Moody ◽  
D. Medlin ◽  
D. Boehme ◽  
D. Norwood

ABSTRACTIn this study, nanoindentation and nanoscratch testing were used to determine the effects of annealing and long term aging on the properties and fracture resistance of thin tantalum nitride resistor films on aluminum nitride substrates. These films were sputter-deposited to a thickness of 440 nm. Some films were left in the as-deposited condition while others were annealed or annealed and then aged. X-ray diffraction revealed that sputter deposition created high compressive residual stresses in the as-deposited films which were partially relieved by annealing. Subsequent aging of the annealed films had no effect on residual stress levels. Nanoindentation showed that mechanical properties were unchanged after annealing and after annealing and aging. However, nanoscratch testing showed that annealing markedly reduced the susceptibility to catastrophic failure with no further changes discernible after aging.


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