Chimney-Shaped and Plateau-Shaped Gate Electrode Field Emission Arrays

1998 ◽  
Vol 509 ◽  
Author(s):  
F. G. Tarntair ◽  
C. C. Wang ◽  
W. K. Hong ◽  
H. K. Huang ◽  
H. C. Cheng
Keyword(s):  
Thin Film Deposition ◽  
Film Deposition ◽  
Uniform Structure ◽  
Flat Panel Display ◽  
Gate Electrode ◽  
Large Area ◽  
Flat Panel ◽  
Field Emitter Arrays ◽  
The Matrix ◽  
Field Emission Arrays

AbstractA triode structure of chimney-shaped field emitter arrays is proposed in this article. This triode structure includes the chimney-shaped emitter, thermal oxidation dioxide, and the plateau-shaped singlecrystalline silicon gate electrode. For the application of the matrix-addressable and large area flat panel display, the uniform structure of the emitters and the yield become critical manufacturing issues when attempting to control nano-meter size features. The uniformity and yield of the chimney-shaped emitters are very well controlled. The nano-sized gate-to-emitter separations can be created by the changing thickness of the insulator. The uniformity of the insulator and emitter material can be controlled within 3% which can be obtained by most large area thin film deposition tools, not by photolithography.

Chimney-Shaped and Plateau-Shaped Gate Electrode Field Emission Arrays

1998 ◽  
Vol 508 ◽  
Author(s):  
F. G. Tarntair ◽  
C. C. Wang ◽  
W.K. Hong ◽  
H. K. Huang ◽  
H. C. Cheng
Keyword(s):  
Thin Film Deposition ◽  
Film Deposition ◽  
Uniform Structure ◽  
Flat Panel Display ◽  
Gate Electrode ◽  
Large Area ◽  
Flat Panel ◽  
Field Emitter Arrays ◽  
The Matrix ◽  
Field Emission Arrays

AbstractA triode structure of chimney-shaped field emitter arrays is proposed in this article. This triode structure includes the chimney-shaped emitter, thermal oxidation dioxide, and the plateau-shaped singlecrystalline silicon gate electrode. For the application of the matrix-addressable and large area flat panel display, the uniform structure of the emitters and the yield become critical manufacturing issues when attempting to control nano-meter size features. The uniformity and yield of the chimney-shaped emitters are very well controlled. The nano-sized gate-to-emitter separations can be created by the changing thickness of the insulator. The uniformity of the insulator and emitter material can be controlled within 3% which can be obtained by most large area thin film deposition tools, not by photolithography.

Characteristics of Parallel Internal-Type Inductively Coupled Plasmas for Large Area Flat Panel Display Processing

2004 ◽  
Vol 43 (7A) ◽  
pp. 4373-4375 ◽  
Author(s):  
Kyong Nam Kim ◽  
Young June Lee ◽  
Seung Jae Jung ◽  
Geun Young Yeom
Keyword(s):  
Flat Panel Display ◽  
Inductively Coupled Plasmas ◽  
Large Area ◽  
Flat Panel ◽  
Inductively Coupled ◽  
Coupled Plasmas

Developing Monolithically Integrated CdTe Devices Deposited by AP-MOCVD

2013 ◽  
Vol 1538 ◽  
pp. 275-280
Author(s):  
S.L. Rugen-Hankey ◽  
V. Barrioz ◽  
A. J. Clayton ◽  
G. Kartopu ◽  
S.J.C. Irvine ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Thin Film Deposition ◽  
Deposition Process ◽  
Film Deposition ◽  
Aluminosilicate Glass ◽  
Organic Chemical ◽  
Large Area ◽  
Monolithically Integrated ◽  
Glass Substrates ◽  
Laser Scribing

ABSTRACTThin film deposition process and integrated scribing technologies are key to forming large area Cadmium Telluride (CdTe) modules. In this paper, baseline Cd1-xZnxS/CdTe solar cells were deposited by atmospheric-pressure metal organic chemical vapor deposition (AP-MOCVD) onto commercially available ITO coated boro-aluminosilicate glass substrates. Thermally evaporated gold contacts were compared with a screen printed stack of carbon/silver back contacts in order to move towards large area modules. P2 laser scribing parameters have been reported along with a comparison of mechanical and laser scribing process for the scribe lines, using a UV Nd:YAG laser at 355 nm and 532 nm fiber laser.

Large-area thin film deposition technologies for fabricating hybrid perovskite solar cells

2016 ◽  
Vol 62 (14) ◽  
pp. 1457-1463
Author(s):  
WeiHai SUN ◽  
CunCun WU ◽  
ZhiJian CHEN ◽  
LiXin XIAO
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Perovskite Solar Cells ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Large Area ◽  
Hybrid Perovskite

Multi-target reactive sputtering—A promising technology for large-area Pb(Zr,Ti)O3 thin film deposition

2007 ◽  
Vol 27 (13-15) ◽  
pp. 3789-3792 ◽  
Author(s):  
G. Suchaneck ◽  
W.-M. Lin ◽  
V.S. Vidyarthi ◽  
G. Gerlach ◽  
J. Hartung
Keyword(s):  
Thin Film ◽  
Reactive Sputtering ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Large Area ◽  
Promising Technology

scholarly journals An Integrated Cleanroom Process for the Vapor Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films

2019 ◽  
Author(s):  
Alexander John Cruz ◽  
Ivo Stassen ◽  
Mikhail Krishtab ◽  
Kristof Marcoen ◽  
Timothée Stassin ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Ex Situ ◽  
Test Case ◽  
Large Area ◽  
Zeolitic Imidazolate Framework ◽  
Deposition Parameters ◽  
The Impact

<p>Robust and scalable thin film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for ZIF-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated <i>via</i> a combination of <i>in situ </i>monitoring and <i>ex situ</i> characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices.<br></p>

scholarly journals Meters-Scale Large-Area Plasma Sources with Multiple Low-Inductance Antenna Units for Next-Generation Flat-Panel Display Processing

2007 ◽  
Vol 32 (2) ◽  
pp. 497-500 ◽  
Author(s):  
Daisuke Tsukiyama ◽  
Kousuke Takenaka ◽  
Yuichi Setsuhara ◽  
Kazuaki Nishisaka ◽  
Akinori Ebe
Keyword(s):  
Flat Panel Display ◽  
Next Generation ◽  
Large Area ◽  
Flat Panel ◽  
Plasma Sources

scholarly journals A machine vision tool for facilitating the optimization of large-area perovskite photovoltaics

2021 ◽  
Vol 7 (1) ◽  
Author(s):  
Nina Taherimakhsousi ◽  
Mathilde Fievez ◽  
Benjamin P. MacLeod ◽  
Edward P. Booker ◽  
Emmanuelle Fayard ◽  
...  
Keyword(s):  
Machine Vision ◽  
Film Thickness ◽  
Current Density ◽  
Defect Density ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Photovoltaic Module ◽  
Process Conditions ◽  
Large Area ◽  
Film Properties

AbstractWe report a fast, reliable and non-destructive method for quantifying the homogeneity of perovskite thin films over large areas using machine vision. We adapt existing machine vision algorithms to spatially quantify multiple perovskite film properties (substrate coverage, film thickness, defect density) with pixel resolution from pictures of 25 cm2 samples. Our machine vision tool—called PerovskiteVision—can be combined with an optical model to predict photovoltaic cell and module current density from the perovskite film thickness. We use the measured film properties and predicted device current density to identify a posteriori the process conditions that simultaneously maximize the device performance and the manufacturing throughput for large-area perovskite deposition using gas-knife assisted slot-die coating. PerovskiteVision thus facilitates the transfer of a new deposition process to large-scale photovoltaic module manufacturing. This work shows how machine vision can accelerate slow characterization steps essential for the multi-objective optimization of thin film deposition processes.

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