scholarly journals A machine vision tool for facilitating the optimization of large-area perovskite photovoltaics

2021 ◽  
Vol 7 (1) ◽  
Author(s):  
Nina Taherimakhsousi ◽  
Mathilde Fievez ◽  
Benjamin P. MacLeod ◽  
Edward P. Booker ◽  
Emmanuelle Fayard ◽  
...  
Keyword(s):  
Machine Vision ◽  
Film Thickness ◽  
Current Density ◽  
Defect Density ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Photovoltaic Module ◽  
Process Conditions ◽  
Large Area ◽  
Film Properties

AbstractWe report a fast, reliable and non-destructive method for quantifying the homogeneity of perovskite thin films over large areas using machine vision. We adapt existing machine vision algorithms to spatially quantify multiple perovskite film properties (substrate coverage, film thickness, defect density) with pixel resolution from pictures of 25 cm2 samples. Our machine vision tool—called PerovskiteVision—can be combined with an optical model to predict photovoltaic cell and module current density from the perovskite film thickness. We use the measured film properties and predicted device current density to identify a posteriori the process conditions that simultaneously maximize the device performance and the manufacturing throughput for large-area perovskite deposition using gas-knife assisted slot-die coating. PerovskiteVision thus facilitates the transfer of a new deposition process to large-scale photovoltaic module manufacturing. This work shows how machine vision can accelerate slow characterization steps essential for the multi-objective optimization of thin film deposition processes.

Developing Monolithically Integrated CdTe Devices Deposited by AP-MOCVD

2013 ◽  
Vol 1538 ◽  
pp. 275-280
Author(s):  
S.L. Rugen-Hankey ◽  
V. Barrioz ◽  
A. J. Clayton ◽  
G. Kartopu ◽  
S.J.C. Irvine ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Thin Film Deposition ◽  
Deposition Process ◽  
Film Deposition ◽  
Aluminosilicate Glass ◽  
Organic Chemical ◽  
Large Area ◽  
Monolithically Integrated ◽  
Glass Substrates ◽  
Laser Scribing

ABSTRACTThin film deposition process and integrated scribing technologies are key to forming large area Cadmium Telluride (CdTe) modules. In this paper, baseline Cd1-xZnxS/CdTe solar cells were deposited by atmospheric-pressure metal organic chemical vapor deposition (AP-MOCVD) onto commercially available ITO coated boro-aluminosilicate glass substrates. Thermally evaporated gold contacts were compared with a screen printed stack of carbon/silver back contacts in order to move towards large area modules. P2 laser scribing parameters have been reported along with a comparison of mechanical and laser scribing process for the scribe lines, using a UV Nd:YAG laser at 355 nm and 532 nm fiber laser.

scholarly journals Transparent ZnO Thin-Film Deposition by Spray Pyrolysis for High-Performance Metal-Oxide Field-Effect Transistors

Materials ◽  
2019 ◽  
Vol 12 (20) ◽  
pp. 3423 ◽  
Author(s):  
Junhee Cho ◽  
Seongkwon Hwang ◽  
Doo-Hyun Ko ◽  
Seungjun Chung
Keyword(s):  
Thin Film ◽  
Metal Oxide ◽  
Spray Pyrolysis ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Spray Pyrolysis Technique ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Zno Films ◽  
Process Conditions

Solution-based metal oxide semiconductors (MOSs) have emerged, with their potential for low-cost and low-temperature processability preserving their intrinsic properties of high optical transparency and high carrier mobility. In particular, MOS field-effect transistors (FETs) using the spray pyrolysis technique have drawn huge attention with the electrical performances compatible with those of vacuum-based FETs. However, further intensive investigations are still desirable, associated with the processing optimization and operational instabilities when compared to other methodologies for depositing thin-film semiconductors. Here, we demonstrate high-performing transparent ZnO FETs using the spray pyrolysis technique, exhibiting a field-effect mobility of ~14.7 cm2 V−1 s−1, an on/off ratio of ~109, and an SS of ~0.49 V/decade. We examine the optical and electrical characteristics of the prepared ZnO films formed by spray pyrolysis via various analysis techniques. The influence of spray process conditions was also studied for realizing high quality ZnO films. Furthermore, we measure and analyze time dependence of the threshold voltage (Vth) shifts and their recovery behaviors under prolonged positive and negative gate bias, which were expected to be attributed to defect creation and charge trapping at or near the interface between channel and insulator, respectively.

Chimney-Shaped and Plateau-Shaped Gate Electrode Field Emission Arrays

1998 ◽  
Vol 509 ◽  
Author(s):  
F. G. Tarntair ◽  
C. C. Wang ◽  
W. K. Hong ◽  
H. K. Huang ◽  
H. C. Cheng
Keyword(s):  
Thin Film Deposition ◽  
Film Deposition ◽  
Uniform Structure ◽  
Flat Panel Display ◽  
Gate Electrode ◽  
Large Area ◽  
Flat Panel ◽  
Field Emitter Arrays ◽  
The Matrix ◽  
Field Emission Arrays

AbstractA triode structure of chimney-shaped field emitter arrays is proposed in this article. This triode structure includes the chimney-shaped emitter, thermal oxidation dioxide, and the plateau-shaped singlecrystalline silicon gate electrode. For the application of the matrix-addressable and large area flat panel display, the uniform structure of the emitters and the yield become critical manufacturing issues when attempting to control nano-meter size features. The uniformity and yield of the chimney-shaped emitters are very well controlled. The nano-sized gate-to-emitter separations can be created by the changing thickness of the insulator. The uniformity of the insulator and emitter material can be controlled within 3% which can be obtained by most large area thin film deposition tools, not by photolithography.

Multi-target reactive sputtering—A promising technology for large-area Pb(Zr,Ti)O3 thin film deposition

2007 ◽  
Vol 27 (13-15) ◽  
pp. 3789-3792 ◽  
Author(s):  
G. Suchaneck ◽  
W.-M. Lin ◽  
V.S. Vidyarthi ◽  
G. Gerlach ◽  
J. Hartung
Keyword(s):  
Thin Film ◽  
Reactive Sputtering ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Large Area ◽  
Promising Technology

scholarly journals An Integrated Cleanroom Process for the Vapor Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films

2019 ◽  
Author(s):  
Alexander John Cruz ◽  
Ivo Stassen ◽  
Mikhail Krishtab ◽  
Kristof Marcoen ◽  
Timothée Stassin ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Ex Situ ◽  
Test Case ◽  
Large Area ◽  
Zeolitic Imidazolate Framework ◽  
Deposition Parameters ◽  
The Impact

<p>Robust and scalable thin film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for ZIF-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated <i>via</i> a combination of <i>in situ </i>monitoring and <i>ex situ</i> characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices.<br></p>

Multiscale structured low-temperature solid oxide fuel cells with 13 W power at 500 °C

2020 ◽  
Vol 13 (10) ◽  
pp. 3459-3468 ◽  
Author(s):  
Sung Soo Shin ◽  
Jeong Hun Kim ◽  
Kyung Taek Bae ◽  
Kang-Taek Lee ◽  
Sang Moon Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Fuel Cell ◽  
Low Temperature ◽  
Solid Oxide Fuel Cells ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Large Area ◽  
Deposition Processes

A multiscale architectured solid oxide fuel cell is demonstrated by applying a large-area ceramic micropatterning and thin-film deposition processes.

TFT Performance - Material Quality Correlation for a-Si:H Deposited at high Rates

1995 ◽  
Vol 377 ◽  
Author(s):  
S. Sherman ◽  
P-Y. Lu ◽  
R. A. Gottscho ◽  
S. Wagner
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Urbach Energy ◽  
Defect Density ◽  
High Rate ◽  
Linear Regime ◽  
Large Area ◽  
Film Properties ◽  
Deposition Power

ABSTRACTWe evaluated the characteristics of a-Si:H/a-SiNx:H thin film transistors (TFTs), and of separately deposited a-Si:H films, as functions of the a-Si:H deposition power in a high-rate, large-area, 40 MHz PE-CVD system. TFT performance and a-Si:H film properties improve with decreasing power density and deposition rate. However, low defect density a-Si:H material was deposited at rates as high as 1500 Å/min. TFTs with gate nitride deposited at 1000 A/min show excellent I-V characteristics when the a-Si:H deposition power is low enough. The TFT electron mobility in the linear regime correlates well with the Urbach energy of the a-Si:H films, suggesting that the quality of the a-Si: H controls the performance of our TFTs.

scholarly journals OLED Fabrication by Using a Novel Planar Evaporation Technique

2014 ◽  
Vol 2014 ◽  
pp. 1-8
Author(s):  
Fu-Ching Tung ◽  
Yi-Shan Wang ◽  
Shih-Hsiang Lai ◽  
Chien-Chih Chen ◽  
Szu-Hao Chen ◽  
...  
Keyword(s):  
Light Emitting Diode ◽  
Single Layer ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Utilization Rate ◽  
Large Area ◽  
Composition Control ◽  
Organic Light Emitting Diode ◽  
Evaporation Technique ◽  
Material Utilization

Organic light-emitting diode fabrication is suffering from extremely high material wasting during deposition especially using a typical point or even line source. Moreover, the need of depositing a high number of emitters and host(s) with a precise composition control in a single layer makes traditional vapor codeposition systems nearly impossible, unless otherwise with a very low yield. To improve, we have developed a novel thin-film deposition system with a planar source loadable with any premetered solvent-mixed organic compounds, plausibly with no component number limitation. We hence demonstrate experimentally, along with a Monte Carlo simulation, in the report the feasibility of using the technique to deposit on a large area-size substrate various organic materials with a relatively high material utilization rate coupling with high film uniformity. Specifically, nonuniformity of less than ±5% and material utilization rate of greater than 70% have been obtained for the studied films.

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