Formation of Self-Assembled Nanometer-Scale InP Islands on Silicon Substrates
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ABSTRACTThree-dimensional islands of InP have been reproducibly grown in the Stranski-Krastanow growth mode on Si (001) and (111) by using metal-organic vapor phase epitaxy in order to obtain nanometer-scale quantum dots. Atomic-force microscopy was used to determine the morphology of the samples and to evaluate the dimensions of the islands. Formation of three-dimensional islands with densities as high as 2.5×1010 cm−2 and small sizes have been observed. The evolution of island morphology is explained in terms of strain-relaxing mechanisms at the first stages of InP/Si heteroepitaxy.
2021 ◽
Vol 112
(2)
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pp. 158-163
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2004 ◽
Vol 33
(2)
◽
pp. 251-258
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