Synthesis of Carbon, Silicon, and Boron-nitride Nanostructures via Microwave Plasma Enhanced Chemical Vapor Deposition
AbstractCarbon, silicon nitride and boron nitride nanostructures were synthesized using microwave plasma enhanced chemical vapor deposition. Both scanning and transmission electron microscopies and x-ray diffraction were used to observe the morphology and structures while energy dispersive x-ray was used to determine the composition of the nanostructured materials. Bamboo-like multiwalled carbon nanotube structures were observed while silicon nitride showed novel needle-like solid structures. All materials were deposited using a thin film iron catalyst seeded on either silicon with reactive plasma gases containing either a mixture of methane and ammonia or ammonia. A general discussion of the nucleation and growth mechanisms for the various materials will also be included.