Remote plasma enhanced chemical vapor deposition of silicon nitride on III–V semiconductors: X‐ray photoelectron spectroscopy studies of the interface
1989 ◽
Vol 7
(3)
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pp. 663-669
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1995 ◽
Vol 34
(Part 2, No. 7B)
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pp. L907-L910
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2004 ◽
Vol 399
(1-3)
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pp. 255-259
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1990 ◽
Vol 8
(4)
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pp. 848
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Keyword(s):
2007 ◽
Vol 38
(1-2)
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pp. 148-151
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2004 ◽
Vol 22
(3)
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pp. 570
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