Two-dimensional electron gas scattering mechanisms in AlGaN/GaN heterostructures

2000 ◽  
Vol 639 ◽  
Author(s):  
E. Borovitskaya ◽  
W. Knap ◽  
M. S. Shur ◽  
R. Gaska ◽  
E. Frayssinet ◽  
...  

ABSTRACTWe present the results of the experimental and theoretical studies of the low field mobility of two-dimensional electrons in the homoepitaxial AlGaN/GaN heterostructures and in the AlGaN/GaN heterostructures grown on SiC. We show that, at cryogenic temperatures, the temperature dependence of the mobility is primarily determined by the deformation potential scattering and that most of other important scattering mechanisms are temperature independent. We show also that two-dimensional (2D) and three-dimensional (3D) mobility models yield very close results. The analysis of the mobility dependence on the electron sheet density ns shows two possible explanations of the non monotonic mobility versus carrier density dependence: i) the alloy/interface scattering and ii) transfer of the 2D electrons into 3D states in GaN. We present experimental data suggesting that for high 2D gas densities in the investigated structure grown on SiC the 2D-3D transition should take place and might be responsible for the mobility decrease at high electron sheet densities.

2016 ◽  
Vol 11 (1) ◽  
pp. 80-87
Author(s):  
Olga Tkachenko ◽  
Vitaliy Tkachenko

We compare three-dimensional electrostatics of semiconductor structures with graphene-like lattices of quantum dots and antidots formed in the plane of the two dimensional electron gas. With lattice constant fixed, the shape of the potential may be tuned so that both lattices have minband spectrum where the second Dirac feature is pronounced and not overlaid by the other states. We show that the lattice of quantum dots is more sensitive to fabrication imperfections, because sources of the disorder are located directly above the electronic channels. Thus the lattices of antidots should be preferred semiconductor artificial graphene candidates.


Electronics ◽  
2019 ◽  
Vol 8 (8) ◽  
pp. 885 ◽  
Author(s):  
Yan Gu ◽  
Dongmei Chang ◽  
Haiyan Sun ◽  
Jicong Zhao ◽  
Guofeng Yang ◽  
...  

An inserted novel polarization-graded AlGaN back barrier structure is designed to enhance performances of In0.17Al0.83N/GaN high electron mobility transistor (HEMT), which is investigated by the two-dimensional drift-diffusion simulations. The results indicate that carrier confinement of the graded AlGaN back-barrier HEMT is significantly improved due to the conduction band discontinuity of about 0.46 eV at interface of GaN/AlGaN heterojunction. Meanwhile, the two-dimensional electron gas (2DEG) concentration of parasitic electron channel can be reduced by a gradient Al composition that leads to the complete lattice relaxation without piezoelectric polarization, which is compared with the conventional Al0.1Ga0.9N back-barrier HEMT. Furthermore, compared to the conventional back-barrier HEMT with a fixed Al-content, a higher transconductance, a higher current and a better radio-frequency performance can be created by a graded AlGaN back barrier.


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