Fast light-induced change in ellipsometry spectra of hydrogenated amorphous silicon measured through a transparent substrate upon bias light illumination

2001 ◽  
Vol 664 ◽  
Author(s):  
N. Hata ◽  
C. M. Fortmann ◽  
A. Matsuda

ABSTRACTPrevious ellipsometric studies of the stability of amorphous silicon (a-Si:H) found reversible changes in the pseudo-dielectric functions. These changes were slow to generate and slow to anneal away. These slow changes are associated with a dangling bond related structural change. Since any light-induced change in the dielectric function is useful for photonic engineering, we undertook the present more detailed study of light induced optical effects in a-Si:H. The optical pseudo-dielectric functions of hydrogenated amorphous silicon (a-Si:H) were measured using spectroscopic ellipsometry (SE) and the “through-the-substrate” measurement technique as a function of measurement temperature and bias light illumination. For the first time we report a light-induced change in a-Si:H materials that is fast, bias-light-dependent, reversible, and temperature dependent. This effect, while not completely understood, offers exciting new prospects for photonic engineering.

2006 ◽  
Vol 20 (14) ◽  
pp. 2035-2047 ◽  
Author(s):  
Q. S. LEI ◽  
Z. M. WU ◽  
J. P. XI ◽  
X. H. GENG ◽  
Y. ZHAO ◽  
...  

Highly stable hydrogenated amorphous silicon (a- Si:H ) films were developed by very high frequency plasma enhanced chemical vapor deposition (VHF PECVD). Their electrical and structural properties were studied. The films were applied as i-layers for p-i-n solar cells. The stability of intrinsic films as well as solar cells was studied. Results suggest that a- Si:H films prepared at high hydrogen dilution ratio (R) and low plasma power (PW) have low hydrogen content (CH) and small microstructure factor (RH) and show high stability against light illumination. The device with i-layer prepared at PW=5 W and R=10 shows a high stability with degradation in fill factor and efficiency of 3.23% and 11.64%, respectively, over 1000 hours illumination. However, the device with i-layer prepared at higher plasma power (PW=25 W ) and lower hydrogen dilution ratio (R=5) was much less stable. The stability of the devices is directly related to the stability of the intrinsic materials.


1985 ◽  
Vol 49 ◽  
Author(s):  
Martin Stutzmann ◽  
Warren B. Jackson ◽  
Chuang Chuang Tsai

AbstractThe dependence of the creation and the annealing of metastable dangling bonds in hydrogenated amorphous silicon on various material parameters will be discussed in the context of a recently proposed model. After a brief review of the kinetic behaviour governing defect creation and annealing in undoped a- Si:H, a number of special cases will be analyzed: the influence of alloying with O, N, C, and Ge, changes introduced by doping and compensation, and the role of mechanical stress. Finally, possibilities to increase the stability of a-Si:H based devices will be examined.


1995 ◽  
Vol 78 (1) ◽  
pp. 317-320 ◽  
Author(s):  
J. P. Kleider ◽  
C. Longeaud ◽  
M. Barranco‐Diaz ◽  
P. Morin ◽  
P. Roca i Cabarrocas

1995 ◽  
Vol 67 (25) ◽  
pp. 3786-3788 ◽  
Author(s):  
Jae Seong Byun ◽  
Hong Bin Jeon ◽  
Kyung Ha Lee ◽  
Jin Jang

1989 ◽  
Vol 149 ◽  
Author(s):  
Byung-Seong Bae ◽  
Deok-Ho Cho ◽  
Jae-Hee Lee ◽  
Choochon Lee ◽  
Jin Jang

ABSTRACTWe investigated the temperature dependent characteristics of hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFT's) at temperatures down to 20 K. With decreasing temperature, the threshold voltage increased, the field effect mobility and the on-current decreased. The measured on-currents versus inverse temperature above 80 K are represented as the sum of two exponentially varied currents. It is concluded that on-current is nearest-neighbour hopping between 120 K and 80 K. Below this temperature, the temperature dependence of on-current is explained by variable range hopping and below about 30 K on-current becomes nearly independent of temperature. At very low temperature hopping probability may be governed not by temperature but by temperature independent tunneling, depending on the overlap of the wave function. The explanation of threshold voltage increase at low temperature is given.


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