Electrical and Structural Properties of Catalytic-Nitrided SiO2 Films
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ABSTRACTThis paper reports structural and electrical properties of catalytic-nitrided silicon dioxide (SiO2) films. The surface of SiO2/Si(100) was nitrided at temperatures below 573 K. It was found that the incorporated N atoms are bound to Si atoms and O atoms and located on the top-surface of SiO2. Catalytic-nitrided SiO2 films have small amounts of Si-OH bonds and adequate resistance to boron (B) penetration.
1970 ◽
Vol 7
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pp. 50-59
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2005 ◽
Vol 49
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pp. 369-376
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2014 ◽
Vol 32
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pp. 331-340
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2011 ◽
Vol 3
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pp. 1-4
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2018 ◽
pp. 168