Large-Area Deposition of Carbon Nanotubes for Field Emission Displays

2001 ◽  
Vol 706 ◽  
Author(s):  
Young-Jun Park ◽  
In-Taek Han ◽  
Ha-Jin Kim ◽  
Yun-Sung Woo ◽  
Nae-Sung Lee ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Field Emission ◽  
Electric Fields ◽  
Direct Synthesis ◽  
Chemical Vapor ◽  
Large Area ◽  
Glass Substrates ◽  
Field Emission Displays ◽  
Area Deposition ◽  
Catalytic Layers

AbstractA direct synthesis of carbon nanotubes (CNTs) on substrates by chemical vapor deposition (CVD) is one of highly probable routes to reach their application to field emission displays. Several stringent requirements are prerequisite for this purpose, including low temperature growth below 600°C to engage glass substrates and large area deposition for practical use. This study carried out synthesis of CNTs by thermal CVD on glass substrates at temperatures as low as 500~550°C. CNTs were grown by thermal decomposition of CO and H2 gases at an atmospheric pressure for different thickness of Invar (an Fe-Ni-Co alloy ) catalytic layers. The growth of CNTs was strongly correlated with preparation of catalytic layers. The diameters and heights of as-grown CNTs increased as the catalytic layers became thicker from 2nm to 30nm. Measurements of the field emission properties of CNTs showed that the threshold electric fields were lowered with increasing thickness of catalytic layers. A uniform electron emission was observed over a large area of 150 × 150mm2, with high emission currents and high brightness.

FABRICATION OF ELECTRON FIELD EMITTERS USING CARBON NANOTUBES

2000 ◽  
Vol 10 (01) ◽  
pp. 5-11
Author(s):  
YOUNG CHUL CHOI ◽  
YOUNG SOO PARK ◽  
YOUNG HEE LEE ◽  
WON BONG CHOI ◽  
NAE SUNG LEE ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Field Emission ◽  
Field Enhancement ◽  
Chemical Vapor ◽  
Large Field ◽  
Single Wall Carbon Nanotubes ◽  
Uniform Field ◽  
Large Area ◽  
Entire Area ◽  
Glass Substrates

Carbon nanotube (CNT)-based field emission displays (FEDs) have been fabricated using well-aligned nanotubes on substrates in situ grown by thermal chemical vapor deposition (CVD), and paste squeeze and surface rubbing techniques. Although the former seems to be an ultimate approach for CNT-based FED, a large area synthesis and uniform field emission over the entire area is not yet easily accessible. On the other hand, the latter is fully scalable on glass substrates and shows very high luminance of 1800 cd/m2 at 4 V/μm. The degradation of emission currents for single-wall carbon nanotubes was less than 10% in electrical aging tests. Large field-enhancement factors (23,000–46,000) and low turn-on voltages (1.5-3 V/μm) were attributed to well-aligned carbon nanotubes on substrates and a large number density of carbon nanotubes of 5-10 μm-2, which was confirmed by high-resolution scanning electron microscopy.

GROWTH OF CARBON NANOTUBES ON THE GLASS SUBSTRATE FOR FLAT PANEL DISPLAY APPLICATIONS

2002 ◽  
Vol 16 (06n07) ◽  
pp. 979-982 ◽  
Author(s):  
JAEMYUNG KIM ◽  
KWANGSOO NO
Keyword(s):  
Carbon Nanotubes ◽  
Current Density ◽  
Chemical Vapor ◽  
Soda Lime ◽  
Emission Current Density ◽  
Emission Current ◽  
Soda Lime Glass ◽  
Flat Panel Display ◽  
Large Area ◽  
Glass Substrates

We have grown carbon nanotubes (CNTs) on the soda-lime glass substrates using chemical vapor deposition of C 2 H 2 gas at 550°C. We used electro-plated Ni thin film as a catalyst and screen-printed Ag thick film as a cathode. The turn-on field was about 2.55 V /μ m with an emission current density of 10 μ A / cm 2, and electric field was about 4.0 V /μ m with an emission current density of 3 mA/cm2. Fowler-Nordheim plot shows good linear fit, indicating that the emission current of CNTs follows the Fowler-Nordheim behavior. This process is suitable for mass production of CNT field emission display(CNT-FED), because of its merits; low temperature (≤ 550° C ) process, easiness of CNT patterning, non-vacuum process, large area uniformity.

Micropatterned Vertically Aligned Carbon Nanotube Growth on a Si Surface or inside Trenches for field-emission devices

2001 ◽  
Vol 706 ◽  
Author(s):  
Jung Inn Sohn ◽  
Seonghoon Lee ◽  
Yoon-Ho Song ◽  
Sung-Yool Choi ◽  
Jin Ho Lee ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Carbon Nanotube ◽  
Field Emission ◽  
Electronic Devices ◽  
Chemical Vapor ◽  
Fabrication Process ◽  
Processing Technologies ◽  
Field Emission Displays ◽  
Vertically Aligned ◽  
Lift Off

AbstractThe good field-emission properties of carbon nanotubes coupled with their high mechanical strength, chemical stability, and high aspect ratio, make them ideal candidates for the construction of efficient and inexpensive field-emission electronic devices. The fabrication process reported here has considerable potential for use in the development of integrated radio frequency amplifiers or field emission-controllable cold electron guns for field emission displays. This fabrication process is compatible with currently used semiconductor processing technologies. Micropatterned vertically aligned carbon nanotubes were grown on planar Si surface or inside the trenches, using chemical vapor deposition, photolithography, pulsed-laser deposition, reactive ion etching, and the lift-off method. To control the field-emission current by a 3rd electrode, the gate electrode, we grew carbon nanotubes inside the trenches. This triode-type structure is the best to realize the gray-scale carbon nanotube field emission. This carbon nanotube fabrication process can be widely applied for the development of electronic devices using carbon nanotube field emitters as cold cathodes and could revolutionize the area of field-emitting electronic devices such as RF amplifiers and field emission displays.

Screen Printing of Carbon Nanotubes for Field Emission Displays

2002 ◽  
Vol 750 ◽  
Author(s):  
Mann Yi ◽  
Hyuck Jung ◽  
Woo-Suk Seo ◽  
Jong-Won Park ◽  
Hyun-Tae Chun ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Carbon Nanotube ◽  
Field Emission ◽  
Screen Printing ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Glass Substrates ◽  
Turn On ◽  
Field Emission Displays ◽  
Processing Variables

ABSTRACTCarbon nanotubes (CNTs) have been significantly used for the field emitters for display applications. It is necessary to investigate the process variables affecting the screen printing of carbon nanotubes for the fabrication of good-quality field emitter devices with uniformity. Screen printing techniques have some advantages such as the short processing time and lower processing cost. The carbon nanotube pastes for screen printing are normally composed of organic binders, carbon nanotubes, and some additive materials. In this study, the carbon nanotube emitters for field emission displays were fabricated with different processing variables such as paste viscosity, paste composition, screen mesh, etc. The CNT pastes were printed on Cr-coated/Ag-printed soda-lime glass substrates. As a result, the processing variables were optimized for the good screen printing. From the I-V characteristics, the turn-on field of single-walled nanotubes was lower than that of multi-walled nanotubes. The decrease in the mesh number of screen masks resulted in decreasing the turn-on field and increasing the electron emission current due to the higher density and vertical alignment of printed-CNTs.

scholarly journals Field Emission from Carbon Films Deposited by Controlled-Low-Energy Beams and CVD Sources

1999 ◽  
Vol 585 ◽  
Author(s):  
Douglas H. Lowndes ◽  
Vladimir I. Merkulov ◽  
L. R. Baylor ◽  
G. E. Jellison ◽  
D. B. Poker ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Surface Morphology ◽  
Field Emission ◽  
Metal Ion ◽  
Ion Beam ◽  
Pyrolytic Graphite ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Damage Site

AbstractThe principal interests in this work are energetic-beam control of carbon-film properties and the roles of doping and surface morphology in field emission. Carbon films with variable sp3-bonding fraction were deposited on n-type Si substrates by ArF (193 nm) pulsed-laser ablation (PLA) of a pyrolytic graphite target, and by direct metal ion beam deposition (DMIBD) using a primary Cs+ beam to generate the secondary C- deposition beam. The PLA films are undoped while the DMIBD films are doped with Cs. The kinetic energy (KE) of the incident C atoms/ions was controlled and varied over the range from ∼25 eV to ∼175 eV. Earlier studies have shown that C films' sp3-bonding fraction and diamond-like properties can be maximized by using KE values near 90 eV. The films' surface morphology, sp3–bonding fraction, and Cs-content were determined as a function of KE using atomic force microscopy, TEM/EELS, Rutherford backscattering and nuclear reaction measurements, respectively. Field emission (FE) from these very smooth undoped and Cs-containing films is compared with the FE from two types of deliberately nanostructured carbon films, namely hot-filament chemical vapor deposition (HF-CVD) carbon and carbon nanotubes grown by plasma-enhanced CVD. Electron field emission (FE) characteristics were measured using ∼25-μm, ∼5-μm and ∼1-μm diameter probes that were scanned with ∼75 nm resolution in the x-, y-, and z-directions in a vacuum chamber (∼5 × 10-7 torr base pressure) equipped with a video camera for viewing. The hydrogen-free and very smooth a-D or a-C films (with high or low sp3 content, and with or without ∼1% Cs doping) produced by PLD and DMIBD are not good field emitters. Conditioning accompanied by arcing was required to obtain emission, so that their subsequent FE is characteristic of the arc-produced damage site. However, deliberate surface texturing can eliminate the need for conditioning, apparently by geometrical enhancement of the local electric field. But the most promising approach for producing macroscopically flat FE cathodes is to use materials that are highly nanostructured, either by the deposition process (e.g. HF-CVD carbon) or intrinsically (e.g. carbon nanotubes). HF-CVD films were found to combine a number of desirable properties for FE displays and vacuum microelectronics, including the absence of conditioning, low turn-on fields, high emission site density, and apparent stability and durability during limited long-term testing. Preliminary FE measurements revealed that vertically aligned carbon nanotubes are equally promising.

Developing Monolithically Integrated CdTe Devices Deposited by AP-MOCVD

2013 ◽  
Vol 1538 ◽  
pp. 275-280
Author(s):  
S.L. Rugen-Hankey ◽  
V. Barrioz ◽  
A. J. Clayton ◽  
G. Kartopu ◽  
S.J.C. Irvine ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Thin Film Deposition ◽  
Deposition Process ◽  
Film Deposition ◽  
Aluminosilicate Glass ◽  
Organic Chemical ◽  
Large Area ◽  
Monolithically Integrated ◽  
Glass Substrates ◽  
Laser Scribing

ABSTRACTThin film deposition process and integrated scribing technologies are key to forming large area Cadmium Telluride (CdTe) modules. In this paper, baseline Cd1-xZnxS/CdTe solar cells were deposited by atmospheric-pressure metal organic chemical vapor deposition (AP-MOCVD) onto commercially available ITO coated boro-aluminosilicate glass substrates. Thermally evaporated gold contacts were compared with a screen printed stack of carbon/silver back contacts in order to move towards large area modules. P2 laser scribing parameters have been reported along with a comparison of mechanical and laser scribing process for the scribe lines, using a UV Nd:YAG laser at 355 nm and 532 nm fiber laser.

Carbon nanotubes grown on different-sized rectangular patterns

2004 ◽  
Vol 19 (6) ◽  
pp. 1803-1807 ◽  
Author(s):  
Lujun Pan ◽  
Yoshikazu Nakayama ◽  
Hideki Shiozaki ◽  
Chikashi Inazumi
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Line Width ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Surface Shape ◽  
Iron Film ◽  
Nucleation Process ◽  
Catalyst Film ◽  
Field Emission Displays

Carbon nanotubes have been synthesized by chemical vapor deposition using a thin iron film as catalyst on the silicon substrate with different-sized rectangular patterns. It is found that the carbon nanotubes grow vertically to the substrate in a high density with a surface shape similar to that of the substrate when the line width of the patterns are larger than 1 μm, However, when the line width of the pattern is reduced to below 0.5 μm, carbon nanotubes cannot grow vertically anymore. This phenomenon might be caused by the relaxation of stress in catalyst film and the coalescence of the catalyst clusters to form particles or grains, which contributes to the migration of catalyst from edge to inner part during the nucleation process. These results are very useful for the fabrication of field-emission displays and other devices using patterned carbon nanotubes.

Large field emission from carbon nanotubes grown on patterned catalyst thin film by thermal chemical vapor deposition

2002 ◽  
Vol 323 (1-4) ◽  
pp. 171-173 ◽  
Author(s):  
Takashi Ikuno ◽  
Tetsuro Yamamoto ◽  
Motoki Kamizono ◽  
Syunji Takahashi ◽  
Hiroshi Furuta ◽  
...  
Keyword(s):  
Thin Film ◽  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Field Emission ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Large Field ◽  
Thermal Chemical Vapor Deposition
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