Low Temperature Deposition of Transparent Ultra Water-Repellent Thin Films by Microwave Plasma Enhanced Chemical Vapor Deposition

2001 ◽  
Vol 711 ◽  
Author(s):  
Yunying Wu ◽  
Yasushi Inoue ◽  
Hiroyuki Sugimura ◽  
Osamu Takai
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Contact Angles ◽  
Water Repellent ◽  
Heating Process ◽  
Water Contact ◽  
Preparation Conditions

ABSTRACTOne of the most common methods for obtaining water repellent surfaces is spreading fluoropolymer or fluoroalkylsilane onto substrates. However, this method is not applicable to low heat-resistant substrates such as plastics, since after spreading, the method requires a heating process which is generally conducted at a temperature of about 600K. The objective of this study is the preparation of ultra water-repellent and optically transparent thin films at low temperatures below 373K. The films were deposited by means of microwave plasma enhanced plasma chemical vapor deposition (MPECVD) using organosilane, that is, trimethylmethoxysilane (TMMOS) as a source with adding Ar, CO2, N2, O2 or air as an excitation gas. Under optimized preparation conditions, films with water contact angles more than 150 degrees and optical transparencies more than 90% were successfully fabricated.

PVDF Films with Superhydrophobic Surface Fabricated by Plasma-Enhanced Chemical Vapor Deposition

2009 ◽  
Vol 79-82 ◽  
pp. 1451-1454 ◽  
Author(s):  
Zhi Qiu Zhang ◽  
Wen Fang Yang ◽  
Zhen Ya Gu ◽  
Rui Ting Huo
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Surface ◽  
Chemical Vapor ◽  
Contact Angles ◽  
Water Repellent ◽  
Treatment Technology ◽  
Water Contact ◽  
Lotus Effect ◽  
Pvdf Membrane

Lotus effect is well-known to be governed by chemical properties and nanotextures of the surfaces. In this paper, a method with two-steps treatment technology was applied to develop the superhydrophobic polyvinylidene fruoride(PVDF) membrane with the property of anti-contamination and self-cleaning. First, the PVDF membrane was treated by oxygen plasma so as to get the reactive groups. Second, this film was deposited by perfluoroalkylethyl acrylate precursor/Ar gas via plasma-enhanced chemical vapor deposition (PECVD). The modified film surface exhibited ultra water-repellent ability, showing that the water contact angles was larger than 150 °and the dynamic contact angles was usually lower than 5°.

Formation of Nitrogen-Vacancy Centers in Homoepitaxial Diamond Thin Films Grown via Microwave Plasma-Assisted Chemical Vapor Deposition

2016 ◽  
Vol 15 (4) ◽  
pp. 614-618 ◽  
Author(s):  
Hideyuki Watanabe ◽  
Hitoshi Umezawa ◽  
Toyofumi Ishikawa ◽  
Kazuki Kaneko ◽  
Shinichi Shikata ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Nitrogen Vacancy ◽  
Nitrogen Vacancy Centers ◽  
Diamond Thin Films

Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

2000 ◽  
Vol 9 (7) ◽  
pp. 545-549
Author(s):  
Zhang Yong-ping ◽  
Gu You-song ◽  
Chang Xiang-rong ◽  
Tian Zhong-zhuo ◽  
Shi Dong-xia ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Nitride ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

scholarly journals AACVD Synthesis and Characterization of Iron and Copper Oxides Modified ZnO Structured Films

Nanomaterials ◽  
2020 ◽  
Vol 10 (3) ◽  
pp. 471 ◽  
Author(s):  
Martha Claros ◽  
Milena Setka ◽  
Yecid P. Jimenez ◽  
Stella Vallejos
Keyword(s):  
Contact Angle ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Contact Angles ◽  
Copper Oxides ◽  
Water Contact ◽  
X Ray ◽  
Hydrophobic Behavior

Non-modified (ZnO) and modified (Fe2O3@ZnO and CuO@ZnO) structured films are deposited via aerosol assisted chemical vapor deposition. The surface modification of ZnO with iron or copper oxides is achieved in a second aerosol assisted chemical vapor deposition step and the characterization of morphology, structure, and surface of these new structured films is discussed. X-ray photoelectron spectrometry and X-ray diffraction corroborate the formation of ZnO, Fe2O3, and CuO and the electron microscopy images show the morphological and crystalline characteristics of these structured films. Static water contact angle measurements for these structured films indicate hydrophobic behavior with the modified structures showing higher contact angles compared to the non-modified films. Overall, results show that the modification of ZnO with iron or copper oxides enhances the hydrophobic behavior of the surface, increasing the contact angle of the water drops at the non-modified ZnO structures from 122° to 135° and 145° for Fe2O3@ZnO and CuO@ZnO, respectively. This is attributed to the different surface properties of the films including the morphology and chemical composition.

Control of Orientation for Polycrystalline Silicon Thin Films Fabricated from Fluorinated Source Gas by Microwave Plasma Enhanced Chemical Vapor Deposition

1998 ◽  
Vol 37 (Part 2, No. 9A/B) ◽  
pp. L1026-L1029 ◽  
Author(s):  
Kouichi Nakahata ◽  
Atsushi Miida ◽  
Toshio Kamiya ◽  
Yoshiteru Maeda ◽  
Charles M. Fortmann ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Silicon Thin Films
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