scholarly journals AACVD Synthesis and Characterization of Iron and Copper Oxides Modified ZnO Structured Films

Nanomaterials ◽  
2020 ◽  
Vol 10 (3) ◽  
pp. 471 ◽  
Author(s):  
Martha Claros ◽  
Milena Setka ◽  
Yecid P. Jimenez ◽  
Stella Vallejos
Keyword(s):  
Contact Angle ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Contact Angles ◽  
Copper Oxides ◽  
Water Contact ◽  
X Ray ◽  
Hydrophobic Behavior

Non-modified (ZnO) and modified (Fe2O3@ZnO and CuO@ZnO) structured films are deposited via aerosol assisted chemical vapor deposition. The surface modification of ZnO with iron or copper oxides is achieved in a second aerosol assisted chemical vapor deposition step and the characterization of morphology, structure, and surface of these new structured films is discussed. X-ray photoelectron spectrometry and X-ray diffraction corroborate the formation of ZnO, Fe2O3, and CuO and the electron microscopy images show the morphological and crystalline characteristics of these structured films. Static water contact angle measurements for these structured films indicate hydrophobic behavior with the modified structures showing higher contact angles compared to the non-modified films. Overall, results show that the modification of ZnO with iron or copper oxides enhances the hydrophobic behavior of the surface, increasing the contact angle of the water drops at the non-modified ZnO structures from 122° to 135° and 145° for Fe2O3@ZnO and CuO@ZnO, respectively. This is attributed to the different surface properties of the films including the morphology and chemical composition.

scholarly journals Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition

Catalysts ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 534
Author(s):  
Alessio Aufoujal ◽  
Ulrich Legrand ◽  
Jean-Luc Meunier ◽  
Jason Robert Tavares
Keyword(s):  
Contact Angle ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Water Contact ◽  
Initiated Chemical Vapor Deposition ◽  
Hydrophobic Recovery ◽  
Topmost Layer ◽  
Nanometric Film ◽  
Polar Functional Groups

Photo-initiated chemical vapor deposition (PICVD) functionalizes carbon nanotube (CNT)-enhanced porous substrates with a highly polar polymeric nanometric film, rendering them super-hydrophilic. Despite its ability to generate fully wettable surfaces at low temperatures and atmospheric pressure, PICVD coatings normally undergo hydrophobic recovery. This is a process by which a percentage of oxygenated functional group diffuse/re-arrange from the top layer of the deposited film towards the bulk of the substrate, taking the induced hydrophilic property of the material with them. Thus, hydrophilicity decreases over time. To address this, a vertical chemical gradient (VCG) can be deposited onto the CNT-substrate. The VCG consists of a first, thicker highly cross-linked layer followed by a second, thinner highly functionalized layer. In this article, we show, through water contact angle and XPS measurements, that the increased cross-linking density of the first layer can reduce the mobility of polar functional groups, forcing them to remain at the topmost layer of the PICVD coating and to suppress hydrophobic recovery. We show that employing a bi-layer VCG suppresses hydrophobic recovery for five days and reduces its effect afterwards (contact angle stabilizes to 42 ± 1° instead of 125 ± 3°).

scholarly journals Transparent superhydrophobic PTFE films via one-step aerosol assisted chemical vapor deposition

RSC Advances ◽  
2017 ◽  
Vol 7 (47) ◽  
pp. 29275-29283 ◽  
Author(s):  
Aoyun Zhuang ◽  
Ruijin Liao ◽  
Sebastian C. Dixon ◽  
Yao Lu ◽  
Sanjayan Sathasivam ◽  
...  
Keyword(s):  
Contact Angle ◽  
Chemical Vapor Deposition ◽  
Water Contact Angle ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Sliding Angle ◽  
Water Contact ◽  
Visible Transmittance ◽  
One Step

Hierarchical micro/nano-structured transparent superhydrophobic polytetrafluoroethylene films with water contact angle 168°, water sliding angle <1° and visible transmittance >90% were prepared on glass via aerosol-assisted chemical vapor deposition.

PVDF Films with Superhydrophobic Surface Fabricated by Plasma-Enhanced Chemical Vapor Deposition

2009 ◽  
Vol 79-82 ◽  
pp. 1451-1454 ◽  
Author(s):  
Zhi Qiu Zhang ◽  
Wen Fang Yang ◽  
Zhen Ya Gu ◽  
Rui Ting Huo
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Surface ◽  
Chemical Vapor ◽  
Contact Angles ◽  
Water Repellent ◽  
Treatment Technology ◽  
Water Contact ◽  
Lotus Effect ◽  
Pvdf Membrane

Lotus effect is well-known to be governed by chemical properties and nanotextures of the surfaces. In this paper, a method with two-steps treatment technology was applied to develop the superhydrophobic polyvinylidene fruoride(PVDF) membrane with the property of anti-contamination and self-cleaning. First, the PVDF membrane was treated by oxygen plasma so as to get the reactive groups. Second, this film was deposited by perfluoroalkylethyl acrylate precursor/Ar gas via plasma-enhanced chemical vapor deposition (PECVD). The modified film surface exhibited ultra water-repellent ability, showing that the water contact angles was larger than 150 °and the dynamic contact angles was usually lower than 5°.

Characterization of Palladium Acetylacetonate as a CVD Precursor for Pd Metallization

1992 ◽  
Vol 282 ◽  
Author(s):  
Steven P. Kowalczyk ◽  
Michael Ldgdlund ◽  
Mats Fahlman ◽  
William R. Salaneck
Keyword(s):  
Chemical Vapor Deposition ◽  
Thermal Treatment ◽  
Vapor Deposition ◽  
Film Formation ◽  
Chemical Vapor ◽  
X Ray ◽  
Palladium Acetylacetonate ◽  
Metallic Palladium

ABSTRACTPalladium acetylacctonate has received much consideration as a possible precursor for chemical vapor deposition of metallic palladium films for a variety of microelectronic applications. We have studied the adsorption and decomposition of palladium acetylacetonate ongold, polyimide, silicon and silver surfaces to understand the initial mechanisms of metallic palladium film formation. In situ x-ray photoelcctron spectroscopy was used to characterized the films after adsorption and their decomposition after thermal treatment or laser irradiation.

Low Temperature Deposition of Transparent Ultra Water-Repellent Thin Films by Microwave Plasma Enhanced Chemical Vapor Deposition

2001 ◽  
Vol 711 ◽  
Author(s):  
Yunying Wu ◽  
Yasushi Inoue ◽  
Hiroyuki Sugimura ◽  
Osamu Takai
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Contact Angles ◽  
Water Repellent ◽  
Heating Process ◽  
Water Contact ◽  
Preparation Conditions

ABSTRACTOne of the most common methods for obtaining water repellent surfaces is spreading fluoropolymer or fluoroalkylsilane onto substrates. However, this method is not applicable to low heat-resistant substrates such as plastics, since after spreading, the method requires a heating process which is generally conducted at a temperature of about 600K. The objective of this study is the preparation of ultra water-repellent and optically transparent thin films at low temperatures below 373K. The films were deposited by means of microwave plasma enhanced plasma chemical vapor deposition (MPECVD) using organosilane, that is, trimethylmethoxysilane (TMMOS) as a source with adding Ar, CO2, N2, O2 or air as an excitation gas. Under optimized preparation conditions, films with water contact angles more than 150 degrees and optical transparencies more than 90% were successfully fabricated.

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