Novel Chemical Approach to Achieve Advanced Soft Lithography by Developing New Stiffer, Photocurable PDMS Stamp Materials

2004 ◽  
Vol 820 ◽  
Author(s):  
Kyung M. Choi ◽  
John A. Rogers

AbstractRecent advances in microfabrication technology allow us to develop a number of novel devices with high performance. In microfabrication technology, a new development, ‘soft lithography’, is widely used by making stamps, molding, and microcontact-printing due to the low cost and easy processability. The resolution of soft lithography significantly relies on the performance of stamping materials. However, pattern transfers using commercially available PDMS stamp materials often end up with mechanical failures such as collapse or sag due to their low physical stiffness. Additionally, most of those commercial PDMS materials are thermally curable systems, which results in significant thermal deformations. These limitations have motivated us to start this work, which demonstrates a ‘chemical approach’ to overcome those limits by developing new stiff, photocurable PDMS stamp materials with attached designed functionalities. Molecular modification of PDMS materials results in advanced soft lithography, which produces enhanced physical toughness, lower polymerization shrinkage, and photopatterning capability.

2016 ◽  
Vol 83 (7) ◽  
Author(s):  
Congrui Jin ◽  
Qichao Qiao

Microcontact printing (MicroCP) is a form of soft lithography that uses the relief patterns on a master polydimethylsiloxane (PDMS) stamp to form patterns of self-assembled monolayers (SAMs) of ink on the surface of a substrate through conformal contact. Pyramidal PDMS stamps have received a lot of attention in the research community in recent years, due to the fact that the use of the pyramidal architecture has multiple advantages over traditional rectangular and cylindrical PDMS stamps. To better understand the dynamic MicroCP process involving pyramidal PDMS stamps, in this paper, numerical studies on frictionless adhesive contact between pyramidal PDMS stamps and transversely isotropic materials are presented. We use a numerical simulation method in which the adhesive interactions are represented by an interaction potential and the surface deformations are coupled by using half-space Green's functions discretized on the surface. It shows that for pyramidal PDMS stamps, the contact area increases significantly with increasing applied load, and thus, this technique is expected to provide a simple, efficient, and low-cost method to create variable two-dimensional arrays of dot chemical patterns for nanotechnology and biotechnology applications. The DMT-type and Johnson–Kendall–Roberts (JKR)-type-to-DMT-type transition regimes have been explored by conducting the simulations using smaller values of Tabor parameters.


2003 ◽  
Vol 788 ◽  
Author(s):  
Kyung M. Choi ◽  
John A. Rogers

ABSTRACTThe development of new materials for organic/plastic electronics allows us to fabricate novel devices through unconventional approaches. The ‘soft lithography technique’ has been widely used in replicating and fabricating small features. This technique is a low cost alternative to photolithography by generating structures from masters to substrates, which employ ‘elastomeric materials’, such as highly stretchable silicon elastomer, polydimethylsiloxane (PDMS) to replicate or transfer the original features to a variety of substrates by molding and printing processes. Since the resolution of pattern transfer significantly relies on the performance of polydimethylsiloxane (PDMS) stamp materials, commercial PDMS materials have shown limitations in high fidelity pattern transfer due to their low physical toughness and high thermal expansion coefficients. For those reasons, pattern fabrications using conventional PDMS materials are unable to satisfy our set of diverse demands, especially in the area of nano-scale replication. To achieve high performance in molding and printing, here we introduce a new strategy, design and synthesis of a modified PDMS silicon elastomer that is a stiffer and photocurable element to achieve our specific task of nano-scale resolution soft lithography. We then demonstrated its unique capabilities for the case of nano-features (300 nm wide) with narrow and tall heights (600 nm height) of photoresist, which is one of the most challenging ‘nano-patterning’ tasks in advanced soft lithography, which is often limited in its use at the nano-scale with other commercially available elastomers.


2007 ◽  
Vol 1029 ◽  
Author(s):  
Piero Cosseddu ◽  
Annalisa Bonfiglio ◽  
Ingo Salzmann ◽  
Jurge P. Rabe ◽  
Norbert Koch

AbstractWe report on the realization of flexible and transparent all-organic Ambipolar Field Effect Transistors. The devices were assembled on a flexible plastic foil, i.e. Mylar®, and the contacts were realized with poly(ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) and patterned by means of Soft Lithography, MicroContact Printing (μCP). As semiconductor layer we used organic bulk heterojunctions of pentacene/C60 realized either by co-deposition of the two different molecules or by a double layer structure in which pentacene was used as buffer layer at the interface with the gate dielectric. Interestingly, all devices (co-deposited and double layer), measured in air, worked in accumulation mode as ambipolar OFETs, however some interesting differences between the two structures can be pointed out. Supported by Atomic Force Microscopy, we demonstrated that growing C60 on a pre-deposited pentacene buffer layer leads to a clear improvement in the morphology and crystallinity of the deposited film allowing to improve n-type conduction by two orders of magnitude. This work is particularly interesting because on one hand it confirms the importance of the substrate properties for the ordered growth of organic semiconductors, which determines the transport properties of organic materials; moreover, it demonstrates, also for n-type and ambipolar transistors, the possibility of avoiding problems normally associated to metal contacts: the lack of mechanical robustness, flexibility, and the unfeasibility of realizing contacts with low cost techniques like printing or soft lithography. The flexibility and transparency of the final OFET structure and the simple low cost fabrication technique employed pave the way for an economic mass production of large area transparent “Plastic Electronics”.


2015 ◽  
Vol 671 ◽  
pp. 157-172 ◽  
Author(s):  
C.Q. Yang ◽  
Hui Yang ◽  
Qin Chen

Blending cotton with synthetic fibers drastically improved durability for use in protective clothing. Developing new flame retardant finishing technology for cotton blends was critical for producing low cost, durable and high performance fire resistance military protective clothing. In this paper, we discussed the flame retardant finishing of the Nomex/cotton (65/35) blend fabric using a hydroxy-functional organophosphorus oligomer (HFPO) in combination with 1,2,3,4-butane-tetracarboxylic acid (BTCA) as a bonding agent and triethanolamine (TEA) as a reactive co-additive. Because cotton was a highly flammable fiber, the Nomex/cotton blend fabric containing more than 20% cotton required flame-retardant finishing treatment. BTCA reacted with HFPO, cotton and TEA to form BTCA/HFPO/TEA/cotton crosslinked polymeric network, which improved the hydrolysis resistance of HFPO, whereas TEA provided synergistic nitrogen to enhance the performance of HFPO. The Nomex/cotton blend treated with the HFPO/BTCA/TEA system shows high flame retardant performance and excellent laundering durability at relatively low add-on levels. We also discussed the flame retardant finishing of the 50/50 nylon/cotton blend military fabrics using the combination of HFPO and dimethyloldihydroxyethyleneurea (DMDHEU), which formed HFPO/DMDHEU crosslinked networks on both cotton and nylon in the blends. The treated blend fabric passed the vertical burning test after 40-50 launderings cycles with negligible fabric strength loss. The heat release rate data indicated that the nylon and cotton fibers interacted with each other during their thermal decomposition on the blend fabric treated with the HFPO/DMDHEU system.


2020 ◽  
Vol 16 (3) ◽  
pp. 246-253
Author(s):  
Marcin Gackowski ◽  
Marcin Koba ◽  
Stefan Kruszewski

Background: Spectrophotometry and thin layer chromatography have been commonly applied in pharmaceutical analysis for many years due to low cost, simplicity and short time of execution. Moreover, the latest modifications including automation of those methods have made them very effective and easy to perform, therefore, the new UV- and derivative spectrophotometry as well as high performance thin layer chromatography UV-densitometric (HPTLC) methods for the routine estimation of amrinone and milrinone in pharmaceutical formulation have been developed and compared in this work since European Pharmacopoeia 9.0 has yet incorporated in an analytical monograph a method for quantification of those compounds. Methods: For the first method the best conditions for quantification were achieved by measuring the lengths between two extrema (peak-to-peak amplitudes) 252 and 277 nm in UV spectra of standard solutions of amrinone and a signal at 288 nm of the first derivative spectra of standard solutions of milrinone. The linearity between D252-277 signal and concentration of amironone and 1D288 signal of milrinone in the same range of 5.0-25.0 μg ml/ml in DMSO:methanol (1:3 v/v) solutions presents the square correlation coefficient (r2) of 0,9997 and 0.9991, respectively. The second method was founded on HPTLC on silica plates, 1,4-dioxane:hexane (100:1.5) as a mobile phase and densitometric scanning at 252 nm for amrinone and at 271 nm for milrinone. Results: The assays were linear over the concentration range of 0,25-5.0 μg per spot (r2=0,9959) and 0,25-10.0 μg per spot (r2=0,9970) for amrinone and milrinone, respectively. The mean recoveries percentage were 99.81 and 100,34 for amrinone as well as 99,58 and 99.46 for milrinone, obtained with spectrophotometry and HPTLC, respectively. Conclusion: The comparison between two elaborated methods leads to the conclusion that UV and derivative spectrophotometry is more precise and gives better recovery, and that is why it should be applied for routine estimation of amrinone and milrinone in bulk drug, pharmaceutical forms and for therapeutic monitoring of the drug.


2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Robert Christie

Abstract This paper presents an overview of the general chemical principles underlying the structures, synthesis and technical performance of azo pigments, the dominant chemical class of industrial organic pigments in the yellow, orange, and red shade areas, both numerically and in terms of tonnage manufactured. A description of the most significant historical features in this group of pigments is provided, starting from the discovery of the chemistry on which azo colorants are based by Griess in the mid-nineteenth century, through the commercial introduction of the most important classical azo pigments in the early twentieth century, including products known as the Hansa Yellows, β-naphthol reds, including metal salt pigments, and the diarylide yellows and oranges, to the development in the 1950s and 1960s of two classes of azo pigments that exhibit high performance, disazo condensation pigments and benzimidazolone-based azo pigments. A feature that complicates the description of the chemical structures of azo pigments is that they exist in the solid state as the ketohydrazone rather than the hydroxyazo form, in which they have been traditionally been illustrated. Numerous structural studies conducted over the years on an extensive range of azo pigments have demonstrated this feature. In this text, they are referred to throughout as azo (hydrazone) pigments. Since a common synthetic procedure is used in the manufacture of virtually all azo (hydrazone) pigments, this is discussed in some detail, including practical aspects. The procedure brings together two organic components as the fundamental starting materials, a diazo component and a coupling component. An important reason for the dominance of azo (hydrazone) pigments is that they are highly cost-effective. The syntheses generally involve low cost, commodity organic starting materials and are carried out in water as the reaction solvent, which offers obvious economic and environmental advantages. The versatility of the approach means that an immense number of products may be prepared, so that they have been adapted structurally to meet the requirements of many applications. On an industrial scale, the processes are straightforward, making use of simple, multi-purpose chemical plant. Azo pigments may be produced in virtually quantitative yields and the processes are carried out at or below ambient temperatures, thus presenting low energy requirements. Finally, provided that careful control of the reaction conditions is maintained, azo pigments may be prepared directly by an aqueous precipitation process that can optimise physical form, with control of particle size distribution, crystalline structure, and surface character. The applications of azo pigments are outlined, with more detail reserved for subsequent papers on individual products.


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