The At-Wavelength Metrology Facility at BESSY-II

The At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates. It consists of an Optics Beamline PM-1 and a Reflectometer in a clean-room hutch as a fixed end station. The bending magnet Beamline is a Plane Grating Monochromator beamline (c-PGM) equipped with an SX700 monochromator. The beamline is specially tailored for efficient high-order suppression and stray light reduction. The versatile 11-axes UHV-Reflectometer can house life-sized optical elements, which are fully adjustable and of which the reflection properties can be measured in the full incidence angular range as well as in the full azimuthal angular range to determine polarization properties.

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Ellipsometric Characterization of Thin Films from Multicomponent Chalcogenide Glasses for Application in Modern Optical Devices

Advances in Condensed Matter Physics ◽

10.1155/2013/308258 ◽

2013 ◽

Vol 2013 ◽

pp. 1-11 ◽

Cited By ~ 5

Author(s):

R. Todorov ◽

J. Tasseva ◽

V. Lozanova ◽

A. Lalova ◽

Tz. Iliev ◽

...

Keyword(s):

Thin Films ◽

Chalcogenide Glasses ◽

Optical Constants ◽

Thermal Evaporation ◽

Optical Devices ◽

Point Of View ◽

Angle Of Incidence ◽

Optical Elements ◽

Ellipsometric Characterization

A review is given on the application of the reflectance ellipsometry for optical characterization of bulk materials and thin films with thickness betweenλ/20 and 2λ(atλ=632.8 nm). The knowledge of the optical constants (refractive index,n, and extinction coefficient,k) of thin films is of a great importance from the point of view of modelling and controlling the manufacture of various optical elements, such as waveguides, diffraction gratings, and microlenses. The presented results concern the optical properties of thin films from multicomponent chalcogenide glasses on the base of As2S3and GeS2determined by multiple-angle-of-incidence ellipsometry and regarded as a function of the composition and thickness. The homogeneity of the films is verified by applying single-angle calculations at different angles. Due to decomposition of the bulk glass during thermal evaporation, an optical inhomogeneity of the thin As (Ge)-S-Bi(Tl) films is observed. The profile ofnin depth of thin As-S-Tl (Bi) films was investigated by evaporation of discrete layers. It is demonstrated that homogenous layers from the previous compounds with controlled composition can be deposited by coevaporation of As2S3and metals or their compounds (Bi, Tl, In2S3).

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Non-linear interferometry with infrared metasurfaces

Nanophotonics ◽

10.1515/nanoph-2021-0011 ◽

2021 ◽

Vol 0 (0) ◽

Author(s):

Anna V. Paterova ◽

Dmitry A. Kalashnikov ◽

Egor Khaidarov ◽

Hongzhi Yang ◽

Tobias W. W. Mass ◽

...

Keyword(s):

Visible Light ◽

Optical Devices ◽

New Method ◽

Optical Elements ◽

Phase Profile ◽

Non Linear ◽

Quantum Interferometry ◽

Light Beams ◽

Visible Photon

Abstract The optical elements comprised of sub-diffractive light scatterers, or metasurfaces, hold a promise to reduce the footprint and unfold new functionalities of optical devices. A particular interest is focused on metasurfaces for manipulation of phase and amplitude of light beams. Characterisation of metasurfaces can be performed using interferometry, which, however, may be cumbersome, specifically in the infrared (IR) range. Here, we realise a new method for characterising metasurfaces operating in the telecom IR range using accessible components for visible light. Correlated IR and visible photons are launched into a non-linear interferometer so that the phase profile, imposed by the metasurface on the IR photons, modifies the interference at the visible photon wavelength. Furthermore, we show that this concept can be used for broadband manipulation of the intensity profile of a visible beam using a single IR metasurface. Our method unfolds the potential of quantum interferometry for the characterization of advanced optical elements.

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Stray light and ghosts in catadioptric spectrometers: incorporating grating scatter measurements into simulations and ghost sensitivity into system design

Advanced Optical Technologies ◽

10.1515/aot-2018-0039 ◽

2018 ◽

Vol 7 (6) ◽

pp. 377-386 ◽

Cited By ~ 1

Author(s):

Monika Kroneberger ◽

Andreas Mezger ◽

Stephanie Becker

Keyword(s):

High Sensitivity ◽

Stray Light ◽

Multiple Diffraction ◽

Optical Elements ◽

Optical Instruments ◽

Light Requirements ◽

Measurement Results ◽

Selection Of

Abstract The accurate simulation of stray light is essential for the verification of the contrast requirements in optical instruments. In a spectrometer, the scattering from reflective gratings is difficult to characterize while contributing significantly to the overall system stray light and reduction of the spectrometer contrast. In addition, the multiple diffraction orders create a ghost sensitive environment, which must be considered in the design of the instrument. In this article, we present an experimental setup for, and measurement results from, the characterization of the bidirectional scattering distribution function (BSDF) of a holographic grating for a spectrometer applied in a typical earth observation mission with demanding stray light requirements. We observed distinct stray light peaks out of the diffraction plane, which are called ‘satellites.’ The main challenges in the measurement of grating BSDFs arise from the near angle limit, the determination of the instrument signature and the selection of the appropriate sampling (2D or 3D). Following the grating characterization, the next step is to introduce these measured BSDFs into stray light simulation. We have done that by fitting appropriate functions to the measured BSDF and defining them in the optical analysis software ASAP as a user-defined BSDF. Ghost analysis is done at the spectrometer level as a sensitivity analysis of the tilts of the optical elements. Due to the ghosting of higher diffraction orders of the grating, a high sensitivity to the tilts of some of the optical elements can be seen.

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Characterization of Rh/Si multilayer structure by HREM and HAADF

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100121016 ◽

1992 ◽

Vol 50 (1) ◽

pp. 122-123

Author(s):

Y. Cheng ◽

J. Liu ◽

M.B. Stearns ◽

D.G. Steams

Keyword(s):

Normal Incidence ◽

High Resolution Electron Microscopy ◽

X Rays ◽

Beam Direction ◽

Cross Sectional ◽

Optical Elements ◽

Resolution Electron ◽

Point To Point ◽

Better Than

The Rh/Si multilayer (ML) thin films are promising optical elements for soft x-rays since they have a calculated normal incidence reflectivity of ∼60% at a x-ray wavelength of ∼13 nm. However, a reflectivity of only 28% has been attained to date for ML fabricated by dc magnetron sputtering. In order to determine the cause of this degraded reflectivity the microstructure of this ML was examined on cross-sectional specimens with two high-resolution electron microscopy (HREM and HAADF) techniques.Cross-sectional specimens were made from an as-prepared ML sample and from the same ML annealed at 298 °C for 1 and 100 hours. The specimens were imaged using a JEM-4000EX TEM operating at 400 kV with a point-to-point resolution of better than 0.17 nm. The specimens were viewed along Si [110] projection of the substrate, with the (001) Si surface plane parallel to the beam direction.

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Characterization of short-term salinity fluctuations in the Neretva River Delta situated in the southern Adriatic Croatia using Landsat-5 TM

Ecological Indicators ◽

10.1016/j.ecolind.2019.105924 ◽

2020 ◽

Vol 110 ◽

pp. 105924 ◽

Cited By ~ 3

Author(s):

Ivan Racetin ◽

Andrija Krtalic ◽

Veljko Srzic ◽

Monika Zovko

Keyword(s):

River Delta ◽

Short Term ◽

Landsat 5 Tm

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Characterization of TaSi2–Si composites for use as wide‐bandpass optical elements for synchrotron radiation

Journal of Applied Physics ◽

10.1063/1.361501 ◽

1996 ◽

Vol 79 (9) ◽

pp. 6803-6810 ◽

Cited By ~ 3

Author(s):

S. R. Stock ◽

Z. U. Rek ◽

M. S. Goorsky

Keyword(s):

Synchrotron Radiation ◽

Optical Elements

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High-resolution characterization of the forbidden Si 200 and Si 222 reflections

Journal of Applied Crystallography ◽

10.1107/s1600576715004732 ◽

2015 ◽

Vol 48 (2) ◽

pp. 528-532 ◽

Cited By ~ 77

Author(s):

Peter Zaumseil

Keyword(s):

High Resolution ◽

Angular Range ◽

Angular Divergence ◽

X Ray Diffraction ◽

Multiple Diffraction ◽

Diffraction Plane ◽

X Ray ◽

Sample Orientation ◽

Plane Sample

The occurrence of the basis-forbidden Si 200 and Si 222 reflections in specular X-ray diffraction ω–2Θ scans is investigated in detail as a function of the in-plane sample orientation Φ. This is done for two different diffractometer types with low and high angular divergence perpendicular to the diffraction plane. It is shown that the reflections appear for well defined conditions as a result of multiple diffraction, and not only do the obtained peaks vary in intensity but additional features like shoulders or even subpeaks may occur within a 2Θ range of about ±2.5°. This has important consequences for the detection and verification of layer peaks in the corresponding angular range.

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