Physical Vapor Deposited Silver (AG) Based Metal-Dielectric Nanocomposites for Advanced Thin-Film and Coating Applications

Metallic thin-film materials and nanoparticles (mainly Silver (Ag)-based) are recently being used in many nano-technological applications including sensors, reflective heat-mirror coatings, and antibacterial coatings as well. The physical vapor deposition technique attracts significant attention for Ag-based nanocomposites with tailoring the structural and optical properties of metallic thin films thus allowing further improvements and application possibilities in various existing fields namely electronics, catalysis, magnetics, optics in alongside the environment and health and new emergent fields in, particularly thin-film coatings. This study highlights the preparation, characterization, properties, and possible future application directions of several types of Silver (Ag)-based nanocomposite thin films prepared by using physical vapor deposition techniques.

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Physical Vapor-Deposited Silver (Ag)-Based Metal-Dielectric Nanocomposites for Thin-Film and Coating Applications

Applied Sciences ◽

10.3390/app11156746 ◽

2021 ◽

Vol 11 (15) ◽

pp. 6746

Author(s):

Mohammad Nur-E-Alam ◽

Mohammad Khairul Basher ◽

Mikhail Vasiliev ◽

Narottam Das

Keyword(s):

Thin Film ◽

Thin Films ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Composite Layer ◽

Future Application ◽

Thin Film Coatings ◽

Environment And Health ◽

Vapor Deposition Technique ◽

Physical Vapor Deposition Technique

Metallic thin-film materials and nanoparticles (mainly silver (Ag)-based) are recently being used in many nano-technological applications, including sensors, reflective heat-mirror coatings, and antibacterial coatings. The physical vapor deposition technique has attracted significant attention for Ag-based nanocomposites with tailoring of the structural and optical properties of metallic thin films, thus allowing for further improvements and application possibilities in various existing fields, namely electronics, catalysis, magnetics, and optics, alongside the environment and health and new emergent fields, particularly thin-film coatings. This study highlights the preparation, characterization, properties, and possible future application directions of several types of silver (Ag)-based nanocomposite thin films prepared by using physical vapor deposition techniques. The high-temperature (above 300 °C) heat-treated composite layer shows significant spectral shifts; however, distinguishingly notable sizes of nanoparticles are not observed, which indicates that this newly developed composite material can be useful for various coating applications.

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Synthesis of lead oxide thin films by using physical vapor deposition technique

Materials Today Proceedings ◽

10.1016/j.matpr.2020.12.716 ◽

2021 ◽

Vol 42 ◽

pp. 2752-2755

Author(s):

Ahmed F. Abdulrahman ◽

Raghad Y. Mohammed ◽

Sabah M. Ahmed ◽

Samir M. Hamad

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Lead Oxide ◽

Physical Vapor Deposition ◽

Deposition Technique ◽

Oxide Thin Films ◽

Vapor Deposition Technique ◽

Physical Vapor Deposition Technique

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DEPOSITION OF THIN FILM COPPER NANOSTRUCTURES BY ELECTRON BEAM PHYSICAL VAPOR DEPOSITION TECHNIQUE ON SiO2/p-TYPE Si(100) AND STUDY OF ITS OXIDATION BEHAVIOR

International Journal of Modern Physics B ◽

10.1142/s0217979211101867 ◽

2011 ◽

Vol 25 (19) ◽

pp. 2567-2574 ◽

Cited By ~ 3

Author(s):

M. YEGANEH ◽

M. SAREMI

Keyword(s):

Thin Film ◽

Electron Beam ◽

Integrated Circuits ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Oxidation Behavior ◽

X Ray Diffraction ◽

Vapor Deposition Technique ◽

Physical Vapor Deposition Technique ◽

P Type

Electron beam physical vapor deposition (EBPVD) is being used in coating components for many applications such as for producing nanostructures and integrated circuits (ICs) coating in electronic industry. In this work, copper was deposited on the SiO 2/p-type Si (100). Thin film characteristics are investigated by scanning electron microscopy and X-ray diffraction (XRD). Then oxidation behavior of deposits was evaluated by Dektak Surface Profiler and weight gain method at 200 and 300°C. Results showed that thin film copper deposited by EBPVD has better oxidation characteristics in comparison with copper foil.

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Structural and optical properties of CdTe/CdSe heterostructure multilayer thin films prepared by physical vapor deposition technique

Applied Nanoscience ◽

10.1007/s13204-012-0150-4 ◽

2012 ◽

Vol 3 (5) ◽

pp. 453-459 ◽

Cited By ~ 14

Author(s):

M. Melvin David Kumar ◽

Suganthi Devadason

Keyword(s):

Thin Films ◽

Optical Properties ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Multilayer Thin Films ◽

Deposition Technique ◽

Structural And Optical Properties ◽

Vapor Deposition Technique ◽

Physical Vapor Deposition Technique

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Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique

Materials Letters ◽

10.1016/s0167-577x(03)00284-2 ◽

2003 ◽

Vol 57 (26-27) ◽

pp. 4170-4175 ◽

Cited By ~ 25

Author(s):

K.C. Mohite ◽

Y.B. Khollam ◽

A.B. Mandale ◽

K.R. Patil ◽

M.G. Takwale

Keyword(s):

Thin Films ◽

Electron Beam ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Silicon Oxynitride ◽

Deposition Technique ◽

Vapor Deposition Technique ◽

Physical Vapor Deposition Technique

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Low Temperature Laser Physical Vapor Deposition of Multilayered Thin Films

MRS Proceedings ◽

10.1557/proc-158-477 ◽

1989 ◽

Vol 158 ◽

Cited By ~ 4

Author(s):

N. Biunno ◽

J. Krishnaswamy ◽

S. Sharan ◽

L. Ganapathi ◽

J. Narayan

Keyword(s):

Thin Films ◽

Substrate Temperature ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Layer By Layer ◽

Deposition Technique ◽

Target Holder ◽

Multi Stage ◽

Vapor Deposition Technique ◽

Physical Vapor Deposition Technique

ABSTRACTWe have investigated the formation of various multilayer thin films by the laser physical vapor deposition technique. A multi stage target holder was constructed to perform all process steps in-situ; target/substrate cleaning, deposition, and annealing. The laser physical vapor deposition technique offers many advantages over conventional physical vapor techniques, such as, lower substrate temperature, microstructural control, and very low contamination levels. Film thickness can be controlled from near atomic to micron dimensions. A layer-by-layer (two dimensional) growth can be achieved, resulting in nonequilibrium structures. The films were analyzed using cross-section and high resolution transmission electron microscopy (TEM). The significant reduction in substrate temperature for the formation of high quality multilayer and epitaxial films opens up many new areas of applications requiring reduced thermal-budget processing.

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