Atmospheric Pressure Chemical Vapor Deposition of CdTe for High-Efficiency Thin-Film PV Devices; Annual Report, 26 January 1998-25 January 1999

Mapping Intimacies ◽

10.2172/14434 ◽

1999 ◽

Author(s):

P V Meyers ◽

R Kee ◽

C Wolden ◽

L Raja ◽

V Kaydanov ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

High Efficiency ◽

Annual Report ◽

Chemical Vapor ◽

Pressure Chemical

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Atmospheric Pressure Chemical Vapor Deposition and Jet Vapor Deposition of CdTe for High Efficiency Thin Film PV Devices: Final Technical Report, 26 January 2000 - 15 August 2002

10.2172/15002205 ◽

2002 ◽

Author(s):

L Woods ◽

P. Meyers

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

High Efficiency ◽

Chemical Vapor ◽

Jet Vapor Deposition ◽

Technical Report ◽

Pressure Chemical

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Atmospheric pressure chemical vapor deposition of CdTe for high efficiency thin film PV devices: Annual subcontract report, 26 January 1999--25 January 2000

10.2172/756255 ◽

2000 ◽

Author(s):

P V Meyers ◽

R Kee ◽

C Wolden ◽

J Kestner ◽

L Raja ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

High Efficiency ◽

Chemical Vapor ◽

Pressure Chemical

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Deposition of c-Axis Aligned Crystalline InGaZnO by Mist Atmospheric Pressure Chemical Vapor Deposition for Thin-Film Transistor Applications

IEEE Transactions on Electron Devices ◽

10.1109/ted.2020.3016633 ◽

2020 ◽

Vol 67 (10) ◽

pp. 4245-4249

Author(s):

Han-Yin Liu ◽

Hao-Chun Hung ◽

Wei-Ting Chen

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Thin Film Transistor ◽

Chemical Vapor ◽

Pressure Chemical

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High-efficiency synthesis of large-area monolayer WS2 crystals on SiO2/Si substrate via NaCl-assisted atmospheric pressure chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2020.147479 ◽

2020 ◽

Vol 533 ◽

pp. 147479

Author(s):

Biao Shi ◽

Daming Zhou ◽

Risheng Qiu ◽

Mohamed Bahri ◽

Xiangdong Kong ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

High Efficiency ◽

Chemical Vapor ◽

Si Substrate ◽

Pressure Chemical

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Fabrication of rough Al doped ZnO films deposited by low pressure chemical vapor deposition for high efficiency thin film solar cells

Current Applied Physics ◽

10.1016/j.cap.2010.02.030 ◽

2010 ◽

Vol 10 (3) ◽

pp. S459-S462 ◽

Author(s):

Doyoung Kim ◽

Ilgu Yun ◽

Hyungjun Kim

Keyword(s):

Thin Film ◽

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Efficiency ◽

Chemical Vapor ◽

Thin Film Solar Cells ◽

Zno Films ◽

Pressure Chemical ◽

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Textured tin oxide films produced by atmospheric pressure chemical vapor deposition from tetramethyltin and their usefulness in producing light trapping in thin film amorphous silicon solar cells

Solar Energy Materials ◽

10.1016/0165-1633(89)90042-7 ◽

1989 ◽

Vol 18 (5) ◽

pp. 263-281 ◽

Author(s):

Roy G. Gordon ◽

James Proscia ◽

Frank B. Ellis ◽

Alan E. Delahoy

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Light Trapping ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Pressure Chemical ◽

Tin Oxide Films

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Development of High‐Efficiency n ‐Type Front and Back Contact Passivated Emitter and Rear Locally Diffused Solar Cells Using Atmospheric Pressure Chemical Vapor Deposition of Phosphosilicate Glass and Laser Processing

physica status solidi (a) ◽

10.1002/pssa.202000117 ◽

2020 ◽

Vol 217 (11) ◽

pp. 2000117

Author(s):

Xia Yan ◽

Ning Chen ◽

Firdaus Bin Suhaimi ◽

Xinyu Zhang ◽

Qi Wang ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Laser Processing ◽

High Efficiency ◽

Chemical Vapor ◽

Back Contact ◽

Pressure Chemical ◽

Phosphosilicate Glass

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Threshold voltage shift of amorphous silicon thin film transistors with atmospheric pressure chemical vapor deposition silicon dioxide

Applied Physics Letters ◽

10.1063/1.111615 ◽

1994 ◽

Vol 64 (18) ◽

pp. 2362-2363 ◽

Author(s):

Jeong Hyun Kim ◽

Eui Yeol Oh ◽

Jung Kee Yoon ◽

Yong Suk Park ◽

Chan Hee Hong

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Thin Film Transistors ◽

Chemical Vapor ◽

Silicon Thin Film ◽

Threshold Voltage Shift ◽

Pressure Chemical

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Atmospheric pressure chemical vapor deposition of blanket tungsten films on silicon substrates for integrated circuit applications

Journal of Electronic Materials ◽

10.1007/bf02659737 ◽

1995 ◽

Vol 24 (6) ◽

pp. 761-766 ◽

Author(s):

M. S. Haque ◽

U. V. Patel ◽

H. A. Naseem ◽

W. D. Brown

Keyword(s):

Chemical Vapor Deposition ◽

Integrated Circuit ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Silicon Substrates ◽

Pressure Chemical

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Generation of InN nanocrystals in organic solution through laser ablation of high pressure chemical vapor deposition-grown InN thin film

Journal of Nanoparticle Research ◽

10.1007/s11051-012-1048-5 ◽

2012 ◽

Vol 14 (8) ◽

Author(s):

Sabri Alkis ◽

Mustafa Alevli ◽

Salamat Burzhuev ◽

Hüseyin Avni Vural ◽

Ali Kemal Okyay ◽

...

Keyword(s):

Thin Film ◽

High Pressure ◽

Chemical Vapor Deposition ◽

Laser Ablation ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Solution ◽

Pressure Chemical

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